基于单光弹调制器的米勒矩阵测量技术
曹绍谦, 步扬, 王向朝, 李思坤, 汤飞龙, 李中梁. 基于单光弹调制器的米勒矩阵测量技术[J]. 光学学报, 2013, 33(1): 0112006.
Cao Shaoqian, Bu Yang, Wang Xiangzhao, Li Sikun, Tang Feilong, Li Zhongliang. Measurement Technique for the Mueller Matrix Based on a Single Photo-Elastic Modulator[J]. Acta Optica Sinica, 2013, 33(1): 0112006.
[1] M. Losurdo, M. M. Giangregorio, P. Capezzuto et al.. Structural and optical properties of nanocrystalline Er2O3 thin films deposited by a versatile low-pressure MOCVD approach [J]. J. Electrochem. Soc., 2008, 155(2): G44~G50
[2] M. Losurdo, M. Bergmair, G. Bruno. Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives [J]. J. Nanopart. Res., 2009, 11(7): 1521~1554
[3] G. R. McIntyre, J. Kye, H. Levinson et al.. Polarization aberrations in hyper-numerical-aperture projection printing: a comparison of various representations [J]. Microlith., Microfab. Microsyst., 2006, 5(3): 033001
[4] S. B. Hatit, M. Foldyna, A. D. Martino et al.. Angle-resolved Mueller polarimeter using a microscope objective [J]. Phys. Stat. Sol. (A)., 2008, 205(4): 743~747
[5] R. A. Chipman. Handbook of Optics [M]. New York: McGraw Hill, Inc., 1995
[6] D. H. Goldstein. Mueller matrix dual-rotating retarder polarimeter [J]. Appl. Opt., 1992, 31(31): 6676~6683
[7] R. W. Collins, J. Koh. Dual rotating-compensator multichannel ellipsometer: instrument design for real-time Mueller matrix spectroscopy of surfaces and films [J]. J. Opt. Soc. Am. A, 1999, 16(8): 1997~2006
[8] I. J. Vaughn, B. G. Hoover. Noise reduction in a laser polarimeter based on discrete waveplate rotations [J]. Opt. Express, 2008, 16(3): 2091~2108
[9] A. D. Martino, Y. K. Kim, E. Garcia-Caurel et al.. Optimized Mueller polarimeter with liquid crystals [J]. Opt. Lett., 2003, 28(8): 616~618
[10] D. Goldstein. Polarized Light [M]. New York: Marcel Dekker, Inc., 2003
[11] Aijun Zeng, Fanyue Li, Linglin Zhu et al.. Simultaneous measurement of retardance and fast axis angle of a quarter-wave plate using one photoelastic modulator [J]. Appl. Opt., 2011, 50(22): 4347~4352
[12] Y. W. Liu, G. A. Jones, Y. Peng et al.. Generalized theory and application of Stokes parameter measurements made with a single photoelastic modulator [J]. Appl. Phys., 2006, 100(6): 063537
[13] B. Wang, T. C. Oakberg. A new instrument for measuring both the magnitude and angle of low level linear birefringence [J]. Rev. Sci. Instrum., 1999, 70(10): 3847~3854
[14] W. Guan, G. A. Jones, Y. W. Liu et al.. The measurement of the Stokes parameters: a generalized methodology using a dual photoelastic modulator system [J]. Appl. Phys., 2008, 49(14): 2644~2652
[15] Y. Takakura, J. E. Ahmad. Noise distribution of Mueller matrices retrieved with active rotating polarimeters [J]. Appl. Opt., 2007, 46(30): 7354~7364
[16] A. Ambirajan, D. C. Look. Optimum angles for a polarimeter: part 1 [J]. Opt. Eng., 1995, 34(6): 1651~1655
[17] 杨坤, 曾爱军, 王向朝 等. 基于基频分量消光的1/4波片快轴标定方法[J]. 中国激光, 2007, 34(11): 1554~1556
Yang Kun, Zeng Aijun, Wang Xiangzhao et al.. Fast axis calibration of quarter-wave plate by fundamental component extinction [J]. Chinese J. Lasers, 2007, 34(11): 1554~1556
[18] 胡建明, 曾爱军, 王向朝. 基于光弹调制技术的波片相位延迟量测量方法[J]. 光学学报, 2006, 26(11): 1681~1686
[19] 曾爱军, 王向朝, 董作人 等. 光弹调制器在偏振方向调制中的应用[J]. 中国激光, 2005, 32(8): 1063~1067
[20] 曾爱军, 王向朝, 李代林 等. 精确标定光弹调制器的新方法[J]. 光学学报, 2005, 25(6): 799~802
[21] Baoliang Wang, T. C. Oakberg. A new instrument for measuring both the magnitude and angle of low level linear birefringence [J]. Rev. Sci. Instrum., 1999, 70(10): 3847~3854
[22] 李凡月, 韩杰, 曾爱军 等. 基于相位调制和样品摆动的1/4波片相位延迟量测量方法[J]. 中国激光, 2011, 38(2): 0208003
曹绍谦, 步扬, 王向朝, 李思坤, 汤飞龙, 李中梁. 基于单光弹调制器的米勒矩阵测量技术[J]. 光学学报, 2013, 33(1): 0112006. Cao Shaoqian, Bu Yang, Wang Xiangzhao, Li Sikun, Tang Feilong, Li Zhongliang. Measurement Technique for the Mueller Matrix Based on a Single Photo-Elastic Modulator[J]. Acta Optica Sinica, 2013, 33(1): 0112006.