CIElab颜色空间坐标是氮化锆薄膜非常关键的技术指标, 而氮分压对氮化锆薄膜颜色坐标有较大的影响。应用中频反应磁控溅射技术沉积氮化锆薄膜, 通过对炉内分压强和氮化锆薄膜颜色的测量, 绘制了氮分压对CIE颜色坐标L*, a*, b*值的影响曲线。发现随炉内氮分压的增大, 薄膜颜色坐标a*, b*值呈环形曲线、L*值呈单调下降的变化趋势。并使用金属自由电子气模型对颜色变化趋势进行了理论分析。发现颜色坐标的变化是由于随氮分压增加, 自由电子浓度降低引起等离子体频率降低造成的。对薄膜的X射线衍射谱(XRD)以及电阻率测量结果的分析表明, 在氮分压较大时, 颜色坐标L*的明显下降变化是由于Zr3N4等的禁带宽度小于可见光谱的极限造成的。

CIE 1976 LAB color space coordinate is an important technical index of ZrN film, and nitrogen partial pressure has a critical effect on ZrN film color coordinate. Mid-frequency reactive magnetron sputtering is adopted to deposite ZrN layer, and through measuring the color of ZrN films and nitrogen partial pressure, the curves of CIE L*, a* and b* values of ZrN films versus nitrogen partial pressure are obtained. The results show that the curve of a* and b* values is a loop curve and L* values decrease with the rise of nitrogen partial pressure. The theoretical analysis is given by metal free-electron model. As the nitrogen partial pressure increases, the variation of color coordinate is caused by decrease of free electrons number of the films and decrease of plasma frequency. The results of X-ray diffraction (XRD) and resistivity measurement indicate that the distinct decrease of L* value at high nitrogen partial pressure is caused by that band gap of Zr3N4 is less than limit of visible light.