光学学报, 2018, 38 (9): 0912002, 网络出版: 2019-05-09
浸没式光刻机对焦控制技术研究 下载: 1355次
Focus Control Technology in Immersion Lithography
补充材料
段晨, 宗明成, 范伟, 孟璐璐. 浸没式光刻机对焦控制技术研究[J]. 光学学报, 2018, 38(9): 0912002. Chen Duan, Mingcheng Zong, Wei Fan, Lulu Meng. Focus Control Technology in Immersion Lithography[J]. Acta Optica Sinica, 2018, 38(9): 0912002.