水靶激光等离子体光源11~20 nm波段光谱实验
齐立红, 李忠芳, 尼启良, 陈波. 水靶激光等离子体光源11~20 nm波段光谱实验[J]. 光学 精密工程, 2005, 13(3): 272.
齐立红, 李忠芳, 尼启良, 陈波. 水靶激光等离子体光源11~20 nm波段光谱实验[J]. Optics and Precision Engineering, 2005, 13(3): 272.
[1] 尼启良.液体微滴喷射靶激光等离子体软X射线源研究[D].中国科学院长春光学精密机械与物理研究所,2003.NI Q L. Study on laser-produced plasma soft X-ray source with liquid aerosol spray target [D]. Thesis P D, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2003. (in Chinese)
[2] BJORN A M. HANSSON M B,OSCAR H G,et al. Xenon liquid jet laser-plasma source for EUV lithography[J]. SPIE, 2000, 3997:729-732.
[3] MOCHIZUKI T, SHIMOURA A, AMANO S, et al. Compact high-average-power laser-plasma X-ray source by cryogenic targets[J]. SPIE, 2001,4504:87-96.
[4] LIN J Q,YASHIRO H,AOTA T,et al. EUV generation using water droplet target[J]. SPIE,2004,5374: 906-911.
[5] VOGT U,STIEL H,WILL I. Scaling-up a liquid water jet laser plasma source to high average power for extreme ultraviolet lithography[J]. SPIE, 2001,4343:87-93.
[7] 曹继红,尼启良,巩岩.虚拟仪器实现极紫外波段光谱数据采集和处理[J].光学精密工程,2002,10(6增):103-106.CAO J H, NI Q L, GONG Y, et al. Data acquisition and processing in EUV with labview program[J]. Optics and Precision Engineering, 2002,10(6 suppl) :103-106. (in Chinese)
[8] JIN F, RICHARDSON M. New laser plasma source for extreme-ultraviolet lithography[J].Appl. Opt., 1995,34(25) :5750-5760.
[9] JIN F,RICHARDSON M,SHIMKAVEG G,et al. Characterization of a laser plasma water droplet EUV source[J]. SPIE, 1995,2523:81-87.
齐立红, 李忠芳, 尼启良, 陈波. 水靶激光等离子体光源11~20 nm波段光谱实验[J]. 光学 精密工程, 2005, 13(3): 272. 齐立红, 李忠芳, 尼启良, 陈波. [J]. Optics and Precision Engineering, 2005, 13(3): 272.