[1] 赵阳, 巩岩.深紫外光刻照明系统光束整形单元的设计［J］.光学 精密工程, 2011,19(1): 29-34.

    ZHAO Y, GONG Y. Design of beam shaping unit for deep ultraviolet lithographic illumination system［J］. Opt. Precision Eng., 2011,19(1): 29-34. (in Chinese)

[2] 巩岩, 张巍.193 nm光刻曝光系统的现状及发展［J］.中国光学与应用光学, 2008, 1(1): 25-35.

    GONG Y, ZHANG W. Present status and progress in 193 nm exposure system in lithography ［J］. Chinese Journal of Optics and Applied Optics, 2008,1(1): 25-35. (in Chinese)

[3] 靳京城, 金春水, 邓文渊.193 nm光学薄膜激光量热吸收测试及系统矫正［J］.分析仪器,2011(1): 59-64.

    JIN J CH, JIN CH SH, DENG W Y. Measuring absorption of 193 nm thin-film by laser calorimetry and system calibration ［J］. Analysis Instruments,2011(1): 59-64. (in Chinese)

[4] 杨光华, 李艳秋.22 nm极紫外光刻物镜热和结构变形及其对成像性能影响［J］.光学学报, 2012, 32(3): 0322005.

    YANG G H, LI Y Q. Thermal and structural deformation of projection optics and its influence on optical imagine performance for 22 nm extreme ultraviolet lithography ［J］. Acta Optica Sinica, 2012, 32(3): 0322005. (in Chinese)

[5] PINNOW D A,RICH T C. Development of a calorimetric method for making precision optical absorption measurements［J］. Appl. Opt., 1973, 12(5): 984-992.

[6] RISTAU D, EBERT J. Development of thermo graphic laser calorimeter ［J］. Applied Optics,1986,25: 4571-4578.

[7] DECKMANN M,WILLAMOWSKI U,RISTAUET D, et al.. Antireflective coating on optical fibers for high-power solid-state lasers ［J］.SPIE,1992,1848: 265-280.

[8] ISO 11551: 2003(E). Test Method for Absorptance of Optical Laser Components［S］. Geneva: International Organization for Standardization, 2003.

[9] ARENBERG J W. An error analysis of ISO 11551［J］. SPIE, 2000,3902: 324-331.

[10] 刘浩, 马平.激光量热计不确定度分析［J］.应用光学, 2011, 32(5): 942-948.

    LIU H, MA P. Uncertainty analysis of laser calorimetry［J］. Journal of Applied Optics, 2011, 32(5): 942-948.(in Chinese)

[11] WILLAMOWSKI U.Measuring the absolute absorptance of optical laser components ［J］. Applied Optics, 1998,37(36): 8362-8370.

[12] BALASA L, BLASCHKE L,IMPACT J,et al..Impact of SiO2 and CaF2 surface composition on the absolute absorption at 193 nm ［J］. SPIE, 2011, 8190: 81901T.

[13] LI W J,LI B CH. Repetition rate dependence of absorption of fused silica irradiated at 193 nm［J］.Chin. Opt. Lett.,2013,11(5): 053002.

[14] NATURA U,MARTIN R,von der GOENNA G,et al.. Kinetics of laser induced changes of characteristic optical properties in lithosil with 193 nm excimer laser exposure［J］. SPIE, 2005, 5754: 1312-1319.