建立了一套新型物理喷束淀积装置,并且成功地进行了薄膜制备工作。所制备的薄膜包括C60,C70,PVK,PVK/C60等薄膜,并测量了物理喷束淀积技术制备得的C60薄膜、PVK/C60混合膜的吸收光谱、荧光光谱、时间分辨率荧光光谱。与C60等薄膜的高真空蒸发膜的相应光谱进行了比较,结果表明,物理喷束淀积可以制备具有很好质量的高抗光损伤薄膜,薄膜的荧光衰减特性与蒸发膜有很大差别。采用该法制备的PVK/C60混合膜中已形成电荷转移络合物。

We have established a new equipment── physical jet deposition system (PJD), and successfully manufactured thin films such as C60, C70, PVK and PVK/C60 combination film by this new system. Based on the comparison of the absorption and photoluminescence (PL) spectra of these films with those of deposited films in normal high vacuum system, we found that the thin films with fine quality and high damage threshold can be made by this new PJD method. It is shown that PL decay behaviour of C60 PJD film is quite different from that of normal C60 film. In the PVK/C60 combination film, charge transfer complex has been observed.