针对微电子光刻机等高端装备中提出的超精密、高速位移测量需求，哈尔滨工业大学深入探索了传统的共光路外差激光干涉测量方法和新一代的非共光路外差激光干涉测量方法，并在高精度激光稳频、光学非线性误差精准抑制、高速高分辨力干涉信号处理等多项关键技术方面取得持续突破，研制了系列超精密高速激光干涉仪，激光真空波长相对准确度最高达9.6×10^-10，位移分辨力为0.077 nm，光学非线性误差最低为13 pm，最大测量速度为5.37 m/s。目前该系列仪器已成功应用于我国350 nm至28 nm多个工艺节点的光刻机样机集成研制和性能测试领域，为我国光刻机等高端装备发展提供了关键技术支撑和重要测量手段。

To meet the ultra-precision and the high-speed displacement measurement requirements of high-end equipments, such as microelectronic lithography machine, the research group from Harbin Institute of Technology has thoroughly explored the traditional heterodyne laser interferometry with coaxial beams and new heterodyne laser interferometry with non-coaxial beams. The group has achieved continuous breakthroughs in many key technologies, including the high-precision laser frequency stabilization, precise suppression of optical nonlinear errors, and high-speed and high-resolution interference signal processing. The group has also developed a series of ultra-precision and high-speed laser interferometers with a vacuum-wavelength relative accuracy up to 9.6 × 10^-10, displacement resolution of 0.077 nm, minimum optical nonlinear error of 13 pm, and maximum measuring speed of 5.37 m/s. Currently, these interferometers have been successfully used in integration development and performance test of lithography machine prototypes with nodes ranging from 350 nm to 28 nm and have provided important technical support and measurement methods for high-end equipments in China.