中国激光, 1987, 14 (4): 237, 网络出版: 2012-08-10
背景气压对激光蒸发金属靶产生的快电子的影响
Effect of background pressure on fast electrons produced from metal target vaporized by laser
摘要
我们对调Q激光(5×108W/cm2)蒸发金属靶产生的快电子进行了实验研究。观察了背景气压对快电子信号的影响。本文对观察到的现象进行了讨论并提出产生的原因。
Abstract
Study was made for the effects of background pressure on the fast electrons produced from metal target evaporization by Q-switched laser light(5x108W/cm2). In this paper, the phenomena observed in the experiment are discussed and explained.
何玮, 吴自遐, 崔俊文, 胡企铨, 林福成. 背景气压对激光蒸发金属靶产生的快电子的影响[J]. 中国激光, 1987, 14(4): 237. He Wei, Wu Zixia, Cui Jumwen, Hu Qiquan, Lin Fucheng. Effect of background pressure on fast electrons produced from metal target vaporized by laser[J]. Chinese Journal of Lasers, 1987, 14(4): 237.
PDF全文
