中国激光, 2014, 41 (6): 0612001, 网络出版: 2014-05-22  

释放孔对微机电系统变形镜光学性能的影响

Effects of Etch Holes on Optical Properties of Micro Electro Mechanical System Deformable Mirror
作者单位
太原理工大学物理与光电工程学院, 山西 太原 030024
摘要
利用表面工艺制作的微机电系统(MEMS)变形镜具有体积小、分辨率高、驱动电压低等优点,然而镜面存在大量的释放孔形成一个规则的阵列结构,影响了变形镜的光学性能。设计制作了一种基于表面工艺的MEMS变形镜单元,研究了释放孔阵列对变形镜光学性能的影响。从夫琅禾费衍射原理出发,建立了二维释放孔阵列的衍射理论模型。研究结果表明,随着释放孔尺寸的增加和相邻释放孔间距的降低,中央零级衍射光强降低,衍射效应增强;同时镜面的有效反射面降低,总反射率降低。释放孔结构影响哈特曼波前传感器对畸变波前的测量性能,使聚焦光斑能量降低,同时随着波前扰动的增强,相邻聚焦光斑发生串扰,波前测量精度降低。
Abstract
Micro electro mechanical system (MEMS) deformable mirrors fabricated by surface technics have the advantages of small volume, high resolution and low driving voltage et al.. However a large number of etch holes on the mirror formed in a regular array structure affect the optical properties of the deformable mirror (DM). We design and manufacture MEMS DM cell based on surface technics, which can be used in the research of effects of etch holes on optical properties of DMs. From the Fraunhofer diffraction theory, diffraction patterns created by two-dimensional etch hole arrays on MEMS DMs have been investigated. Research result shows that when the dimensions of etch holes increase and adjacent spacings of etch holes decrease, the central zero-order diffracted light intensity decreases and the diffraction effect increases, leading to decreases of the effective reflection surface and reflectivity of DM surface. The etch hole structures affect measurement performance of Shark-Hartmann wavefornt sensor on wavefront aberration. Because they can reduce the energy of focal spot and reduce the accuracy of wavefornt measurement with the disturbance of wavefornt enhanced and focused spot adjacent crosstalk.

蔡冬梅, 遆培培, 贾鹏, 王东. 释放孔对微机电系统变形镜光学性能的影响[J]. 中国激光, 2014, 41(6): 0612001. Cai Dongmei, Ti Peipei, Jia Peng, Wang Dong. Effects of Etch Holes on Optical Properties of Micro Electro Mechanical System Deformable Mirror[J]. Chinese Journal of Lasers, 2014, 41(6): 0612001.

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