光学 精密工程, 2015, 23 (11): 3005, 网络出版: 2016-01-25   

高沉积率激光金属沉积Inconel 718的孔隙率控制

Porosity control of Inconel 718 in high deposition-rate laser metal deposition
作者单位
1 中国科学院 长春光学精密机械与物理研究所, 吉林 长春 130033
2 中国科学院大学, 北京 100049
3 Fraunhofer激光技术研究所, Germany Aachen 52074
引用该论文

仲崇亮, 付金宝, 丁亚林, Andres Gasser. 高沉积率激光金属沉积Inconel 718的孔隙率控制[J]. 光学 精密工程, 2015, 23(11): 3005.

ZHONG Chong-liang, FU Jin-bao, DING Ya-lin, ANDRES Gasser. Porosity control of Inconel 718 in high deposition-rate laser metal deposition[J]. Optics and Precision Engineering, 2015, 23(11): 3005.

参考文献

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仲崇亮, 付金宝, 丁亚林, Andres Gasser. 高沉积率激光金属沉积Inconel 718的孔隙率控制[J]. 光学 精密工程, 2015, 23(11): 3005. ZHONG Chong-liang, FU Jin-bao, DING Ya-lin, ANDRES Gasser. Porosity control of Inconel 718 in high deposition-rate laser metal deposition[J]. Optics and Precision Engineering, 2015, 23(11): 3005.

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