中国激光, 2012, 39 (4): 0416001, 网络出版: 2012-03-17   

均匀辐照365 nm LED光源设计及其在光刻中的应用

Design of Uniform Illumination Optical Source with 365 nm LED and Application in Lithography
作者单位
1 中国科学技术大学光学与光学工程系, 安徽 合肥 230026
2 巢湖学院物理与电子科学系, 安徽 巢湖 238000
引用该论文

王向贤, 汪波, 傅强, 陈漪恺, 胡继刚, 张斗国, 明海. 均匀辐照365 nm LED光源设计及其在光刻中的应用[J]. 中国激光, 2012, 39(4): 0416001.

Wang Xiangxian, Wang Bo, Fu Qiang, Chen Yikai, Hu Jigang, Zhang Douguo, Ming Hai. Design of Uniform Illumination Optical Source with 365 nm LED and Application in Lithography[J]. Chinese Journal of Lasers, 2012, 39(4): 0416001.

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王向贤, 汪波, 傅强, 陈漪恺, 胡继刚, 张斗国, 明海. 均匀辐照365 nm LED光源设计及其在光刻中的应用[J]. 中国激光, 2012, 39(4): 0416001. Wang Xiangxian, Wang Bo, Fu Qiang, Chen Yikai, Hu Jigang, Zhang Douguo, Ming Hai. Design of Uniform Illumination Optical Source with 365 nm LED and Application in Lithography[J]. Chinese Journal of Lasers, 2012, 39(4): 0416001.

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