由单层HfO2,SiO2,Y2O3,Al2O3膜求出其折射率和消光系数色散曲线,据此计算出HfO2/SiO2,Y2O3/SiO2,Al2O3/SiO2的193 nm多层膜反射膜曲线,并用电子束热蒸发的方法进行镀制。由分光光度计测量样品的透射率和绝对反射率,求出了各种膜层的吸收曲线。结果发现HfO2/SiO2,Al2O3/SiO2反射率实验结果与理论结果吻合得很好,而Y2O3/SiO2的理论曲线偏高。通过模拟Y2O3/SiO2的反射率曲线发现Y2O3的消光系数远大于由单层膜实验得出的结果。这说明Y2O3膜层的吸收特性与薄膜的制备工艺密切相关。

Refractive index and extinction coefficient curves of HfO2, Y2O3, Al2O3 and SiO2 were obtained from their corresponding single-layer thin films. HfO2/SiO2, Y2O3/SiO2 and Al2O3/SiO2 multilayer thin films were deposited by e-beam evaporation. Measurement results show that the experimental reflectances of HfO2/SiO2 and Al2O3/SiO2 agreed very well with the theoretical results, but the experimental result of Y2O3/SiO2 was much lower than the calculated theoretical result which told us that the absorptance performance of Y2O3 relied deeply on the deposition conditions. Deposition environment of Y2O3/SiO2 multilayer may create a large amount of non stoichiometrical Y2O3 which made the absorptance increased abruptly. In addition, absorptances of the fused silica substrate and these multilayer thin films were obtained through calculation.