投影物镜波像差在线检测技术是极紫外光刻(EUVL)实现32 nm及其以下技术节点的关键技术,对于光刻机的整机集成具有重要研究意义和实用价值。介绍了目前国际上极紫外光刻投影物镜波像差在线检测技术的最新研究进展以及几种主流检测技术的原理和特点,并对其检测精度、检测速度以及动态测量范围等技术指标进行了比较分析;分析了开发投影物镜波像差在线检测设备所应解决的若干关键技术;最后,对极紫外光刻投影物镜波像差在线检测技术的发展进行了总结和展望。

The at-wavelength interferometry of projection optics,which has important research significance and practical value in integration of lithography tool,is one of the core enabling techniques for extreme ultraviolet lithography (EUVL) facing 32 nm technology node and beyond. In this paper,recent developments of at-wavelength interferometry of EUVL optics are reviewed. Several key interferometry techniques are presented in details. The important parameters of the key techniques,such as,measurement accuracy,speed and dynamic range etc. are analyzed and compared. The core techniques in developing at-wavelength intereferometry device are analyzed. Finally,a summary is given and some prospects for at-wavelength interferometry of EUVL optics are proposed.