摘要

随着平板显示技术的发展, 透明电极ITO膜的厚度越来越薄。为了测试这种极薄的ITO膜, 本文通过改进已有的频域分析算法, 以便测试膜厚在20~150 nm之间的ITO膜。与现有算法相比, 该算法有效改进了各个波长的位相解析精度。实验结果表明, 待测透明电极薄膜的厚度为90～104 nm, 其结果和标定值一致, 证明了该算法能够测量膜厚小于100 nm的透明电极ITO薄膜。

Abstract

The transparent electrode thin film of ITO is widely used to implement the touch function of flat panel display(FPD). Its physical thickness has a great impact on touch panel operation, therefore it is very important to measure the thickness of transparent electrode film. The frequency domain analysis algorithm has been used to measure film thickness. However, it is difficult to measure the very thin film. A new algorithm is proposed to measure the film thickness ranged from 20 nm to 150 nm. This algorithm aims to get the precision phase distribution due to multiple reflection of film. The experimental results show that the thickness of the measured transparent electrode film is 90-104 nm, which illustrates that there is no difference from the calibration value. This result proves that the new algorithm can be used to measure the very thin film of ITO within 100 nm.

补充资料

中图分类号：O438;O439

DOI：10.3788/co.20150804.0567

所属栏目：微纳光学

收稿日期：2015-03-26

修改稿日期：2015-04-22

网络出版日期：--

作者单位    点击查看

联系人作者：伊藤雅英(itoh@bk.tsukuba.ac.jp)

【1】张亚萍,殷海荣,黄剑锋, 等.透明导电薄膜的研究进展[J].光机电信息,2006(2): 56-60.
ZHANG Y P,YIN H R,HUANG J F,et al.. Recent progress in transparent and conducting films[J]. OME Information,2006(2): 56-60.(in Chinese)

【2】张明福,许文彬,沈海涛, 等.透明导电氧化物薄膜研究的新进展[J].压电与声光,2010,32(5): 811-815.
ZHANG M F,XU W B,SHEN H T,et al.. New research progress of transparent conductive oxide films[J]. Piezoelectrics & Acoustooptics,2010,32(5): 811-815.(in Chinese)

【3】MINAMI T. Present status of transparent conducting oxide thin-film development for Indium-Tin-Oxide(ITO) substitutes[J]. Thin Solid Films,2008,516(17): 5822-5828.

【4】ZHANG CH,ZHAO D W,GU D,et al.. An ultrathin, smooth, and low-loss Al-doped Ag film and its application as a transparent electrode in organic photovoltaics[J]. Advanced Materials,2014,26(32): 5696-5701.

【5】罗远晟, 陈松林, 马平, 等.膜厚对ITO薄膜的电学与光学性质的影响[J].压电与声光,2010,32(6): 1024-1026.
LUO Y SH,CHEN S L,MA P,et al.. Influence of thickness on electrical and optical property of ITO thin films[J]. Piezoelectrics & Acoustooptics,2010,32(6): 1024-1026.(in Chinese)

【6】耿东锋,何英杰,苏宏毅.透明台阶的白光干涉测量方法研究[J].光学仪器,2013,35(6): 74-77.
GENG D F,HE Y J,SU H Y. Study on the measurement of transparent step by white-light interferometer[J]. Optical Instruments,2013,35(6): 74-77.(in Chinese)

【7】SATO S,NAKANO T,BABA S. Structure and its evolution of in island films on Si substrates revealed in their depth-profiles of X-ray photoelectron spectroscopy[J]. J. Vacuum Society of Japan,2005,48(3): 121-123.

【8】ITOH M,YAMADA R,TIAN R L,et al.. Broad-band light-wave correlation topography using wavelet transform[J]. Optical Review,1995,2(2): 135-138.

【9】MA L,GUO T,YUAN F. Thick film geometric parameters measurement by white light interferometry[C]. International Conference on Optical Instruments and Technology.Shanghai,China,2009(7507): 750701-750709.

【10】KIM S W,KIM G H. Thickness profile measurement of transparent thin-film layers by white-light scanning interferometry[J]. Applied Optics,1999,38(28): 5968-5973.

【11】LI MCH,WAN DSH,LEE CH CH. Application of white light scanning interferometer on transparent thin film measurement[J]. Applied Optics,2012,51(36): 8579-8586.

【12】DECK L,DE G P. High-speed noncontact profiler based on scanning white-light interferometry[J]. Applied Optics,1994,33(31): 7334-7338.

【13】DE G P,DECK L. Three-dimensional imaging by sub-nyquist sampling of white-light interferograms[J]. Optics Letters,1993,18(17): 1462-1464.

【14】KINO G S,CHIM S S C. Mirau correlation microscope[J]. Applied Optics,1990,29(26): 3775-3783.

【15】谢元安,韩志刚.基于白光干涉的空间频域算法研究[J].光电工程,2011,38(7): 81-85.
XIE Y A,HAN ZH G. Study of spatial frequency domain analysis method based on white light interferometry[J]. Opto. Electronic Engineering,2011,38(7): 81-85.(in Chinese)

【16】CHEN S,PALMER A W,GRATTAN K T V,et al.. Digital signal-processing techniques for electronically scanned optical-fiber white-light interferometry[J]. Applied Optics,1992,31(28): 6003-6010.

【17】徐海涛,刘晓军,卢文龙, 等.垂直扫描白光干涉信号的计算机快速模拟[J].光学技术,2013,39(3): 195-199.
XU H T,LIU X J,LU W L,et al.. Efficient signal modeling for vertical scanning white light interference microscopy[J]. Optical Technique,2013,39(3): 195-199.(in Chinese)

【18】薛晖, 沈伟东, 顾培夫, 等.基于白光干涉的光学薄膜物理厚度测量方法[J].光学学报, 2009,29(7): 1877-1880.
XUE H,SHEN W D,GU P F,et al.. Thickness measurement of thin film based on white-light spectral interferometry[J]. Acta Optica Sinica,2009,29(7): 1877-1880.(in Chinese)

【19】HIDEMITU O,KENICHI S,SEINA F. Simultaneous measurement of film thickness and surface profile of film-covered objects by using white-light interferometry[J]. The Society of Instrument and Control Engineers,2007,43(2): 71-77.(in Japanese)

【20】LARKIN K G. Efficient nonlinear algorithm for envelope detection in white light interferometry[J]. J. Opt. Soc. Am. A,1996,13(4): 832-843.

【21】徐永祥,张乾方,刘松松.基于空间频域算法的三维微观形貌的测量[J].光电工程,2014,41(8): 16-21.
XU Y X,ZHANG Q F,LIU S S. 3D Micro topography measurement based on spatial frequency domain algorithm[J]. Opto-Electronic Engineering,2014,41(8): 16-21.(in Chinese)

引用该论文

CHEN Kai,LEI Feng,ITOH Masahide. Measurement of ITO transparent electrode film thickness with white-light interferometer[J]. Chinese Optics, 2015, 8(4): 567-573

陈凯,雷枫,伊藤雅英. 白光干涉测量超薄透明电极ITO薄膜的厚度[J]. 中国光学, 2015, 8(4): 567-573