Chinese Optics Letters, 2016, 14 (5): 051603, Published Online: Aug. 6, 2018
Fabrication and characteristics of silicon-rich oxide thin films with controllable compositions Download: 797次
160.4670 Optical materials 310.6860 Thin films, optical properties 310.1860 Deposition and fabrication
Abstract
Silicon-rich oxide films with controllable optical constants and properties are deposited by the reactive magnetron sputtering method on a Si target. The O/Si atomic ratio x of SiO x is tuned from 0.12 to 1.84 by adjusting the oxygen flow rate, which is found to be a more effective way to obtain SiO x films compared with changing the oxygen content [O 2 / ( Ar + O 2 ) ratio]. The optical properties of SiO x films can be tuned from semiconductor to dielectric as a function of ratio x . The structures and components are also investigated by an x ray photoelectron spectroscopy analysis of the Si 2p core levels, the results of which exhibit that the structures of SiO x can be thoroughly described by the random bonding model.
Shiyu Zhang, Quanjun Pan, Xu Fang, Kening Mao, Hui Ye. Fabrication and characteristics of silicon-rich oxide thin films with controllable compositions[J]. Chinese Optics Letters, 2016, 14(5): 051603.