采用532 nm波长的纳秒脉冲激光对由直流磁控溅射法制备的Ti/FTO复合薄膜表面进行了辐照处理，研究了激光能量密度对薄膜的表面形貌、晶体结构、光学性能和电学性能的影响。结果表明,采用适当能量密度的激光对薄膜进行激光辐照处理，一方面可对薄膜表面起到退火作用，促进薄膜晶粒生长、消除部分晶体缺陷，另一方面还可促使Ti层氧化成TiO2层，最终使薄膜的综合光电性能得到提升。

The surface of Ti/FTO composite films prepared with the direct current magnetron sputtering method is irradiated by a nanosecond pulsed laser with a wavelength of 532 nm. The effects of laser energy density on surface morphology, crystal structure, optical and electrical properties of the films are studied. The results show that the irradiation of films with appropriate laser energy density has the annealing effect on film surfaces, which on the one hand promotes film grain growth and eliminates partial crystal defects, and on the other hand, gives rise to the transformation of Ti layer to TiO2 layer via oxidation, and finally improves the overall photoelectric property of the films.