为满足光学器件透红外屏蔽电磁波的要求, 在PET柔性基底上制作了金属网栅透明屏蔽膜.分析网栅参数对其屏蔽效率及透过率的影响, 选取结构参数.针对PET基底的柔性特点及其热稳定性, 经试验研究优化光刻工艺中的提拉速度、烘烤时间及温度等参数, 从而得到高质量的图形结构.采用磁控溅射法制备透明屏蔽膜, 通过优化溅射功率、溅射气压等参数使膜/基结合更牢固.最后得到线宽为3 μm、周期为250 μm的金属网栅透明屏蔽膜.采用分光光度计测得其在300～2 200 nm波段的平均透过率为77%; 采用屏蔽室法测得其在2～18 GHz频段的电磁屏蔽效率为12 dB以上.

In order to meet the requirements of optical devices for passing infrared waves and shielding electromagnetic waves, a transparent metal mesh shielding film was fabricated on PET flexible substrates. The influence of mesh parameters on shielding efficiency and transmittance was analyzed, and the structural parameters were selected. For the flexibility and thermal stability of PET substrate, high-quality graphics structure was obtained after optimizing pulling speed, baking time, temperature and other parameters in the lithography process. Transparent shielding film was prepared by magnetron sputtering and the film/substrate bonding was strengthened by optimizing sputtering power, sputtering pressure and other parameters. Finally, a metal mesh transparent shielding film with a line width of 3 μm and a cycle of 250 μm was made. The average transmittance in the 300～2 200 nm band was 77% by spectrophotometer, the electromagnetic shielding efficiency in the 2~18 GHz band which measured by shielding room method is higher than 12 dB.