采用可见光波段的488 nm、518 nm和637 nm激光对氧化石墨烯薄膜样品进行光照还原实验, 并实时测量还原氧化石墨烯的透过率和电阻率, 通过其变化规律表征不同波长的激光对氧化石墨烯还原程度的影响.结果表明: 氧化石墨烯的透过率和电阻率在不同波长激光照射下呈现不同的变化规律.采用488 nm激光照射时, 在激光功率密度很小的条件下, 氧化石墨烯即可发生还原反应, 还原过程符合光化学还原规律; 采用518 nm与637 nm激光照射时, 只有当激光功率密度大于某一阈值时, 氧化石墨烯才发生还原反应; 激光波长越长, 功率阈值越高; 还原过程符合光热还原规律.该研究结果可为光还原石墨烯薄膜的图案化工艺改进提供参考和依据.

The 488 nm, 518 nm and 637 nm lasers in visible wavelength band were used to carry out the light reduction experiment on the graphene oxide samples. Meanwhile the transmittance and resistance of reduced graphene oxide were measured in real time to investigate effect of laser with different wavelengths on reduction of graphene oxide. The results show that the transmittance and resistivity of reduced graphene oxide appear different variation under different wavelengths laser irradiation. When 488 nm laser is used, the sample can be reduced though under the condition of low power density, and the reduction process is in accordance with the photochemical reaction. When using 518 nm and 637 nm laser, only when the laser power density is greater than a certain threshold, can the graphene oxide be reduced; longer the laser wavelength, higher the power threshold; and the reduction process conforms to photothermal reaction. The results can pave a way for the improvement of the patterning process of graphene film.