激光与光电子学进展, 2018, 55 (6): 061203, 网络出版: 2018-09-11
多点实时光刻机光源照度均匀度检测系统设计 下载: 1145次
Design of Multi-Point Real-Time Lithography Light Source Uniformity Detection System
测量 照度均匀度 多点测量 光刻技术 光刻机 实时检测 measurement illumination non-uniformity multi-point detection lithography lithography machines real-time detection
摘要
提出了一种光刻机照度均匀度多点测量方法,该方法利用紫外增强PIN光电二极管,同时快速测量曝光机照面多点的光强,通过在传统电流-电压放大电路的基础上进行改进,同时使用复合放大的方法,大大提高了曝光机照度均匀度多点测量方法的重复性,使每一测量单点测量重复性控制在0.02 mW/cm
2。利用紫外增强PIN光电二极管光刻机光源进行实验,结果表明,多点测量一致性小于0.1 mW/cm
2,且检测的照度均匀性符合要求。
Abstract
A multi-point measurement method for illuminance uniformity of lithography machines is proposed. The method of using ultraviolet (UV) enhanced PIN photodiode can rapidly measure the light intensity of the exposure machine, and the combination of improvement on the basis of traditional current-voltage amplifying circuit and composite amplification greatly improves the repeatability of exposure machine illuminance uniformity multi-point measurement method, and makes every single point measurement repeatability of measurement below 0.02 mW/cm
2. Experimental results show that with the use of UV enhanced PIN photodiode exposure machine light source, multi-point measurement consistency is less than 0.1 mW/cm
2, and the detection of the illuminance uniformity meets the requirements.
赵可为, 谭艾英, 尹韶云, 蔡文涛, 杨若夫, 陈建军, 佟首峰. 多点实时光刻机光源照度均匀度检测系统设计[J]. 激光与光电子学进展, 2018, 55(6): 061203. Kewei Zhao, Aiying Tan, Shaoyun Yin, Wentao Cai, Ruofu Yang, Jianjun Chen, Shoufeng Tong. Design of Multi-Point Real-Time Lithography Light Source Uniformity Detection System[J]. Laser & Optoelectronics Progress, 2018, 55(6): 061203.