摘要

提出了一种光刻机照明系统的多自由度均匀性校正方法。当照明光瞳的部分相干因子发生变化时，该方法的校正手指只需整体在光轴方向进行微调就能使照明光场的均匀性满足要求。仿真分析了校正手指的三维空间移动对照明光场均匀性的影响，并验证了该方法的高效性。

Abstract

A multi-degree-of-freedom uniformity correction method of the illumination system in a lithography machine is proposed. When the partial coherence factor of the illumination pupil changes, the fine tuning of the whole correction fingers along the direction of the optical axis in the proposed method is enough to make the light illumination uniformity meet the requirements. The effect of the three-dimensional spatial movement of correction fingers on the light illumination uniformity is analyzed by simulation, and the high efficiency of this method is verified.

补充资料

中图分类号：O435.1

DOI：10.3788/aos201838.1022004

所属栏目：光学设计与制造

基金项目：政府间国际科技创新合作重点专项(2016YFE0110600)、上海市国际科技合作基金项目(16520710500)、上海市科技人才计划项目(17YF1429500)、中国科学院青年创新促进会资助

收稿日期：2018-01-31

修改稿日期：2018-05-18

网络出版日期：2018-05-21

作者单位    点击查看

联系人作者：黄惠杰(huanghuijie@siom.ac.cn); 程伟林(chengweilin@siom.ac.cn);

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引用该论文

Cheng Weilin,Zhang Fang,Lin Dongliang,Zeng Aijun,Yang Baoxi,Huang Huijie. Multi-Degree-of-Freedom Uniformity Correction Method of Illumination System in Lithography Machine[J]. Acta Optica Sinica, 2018, 38(10): 1022004

程伟林,张方,林栋梁,曾爱军,杨宝喜,黄惠杰. 光刻机照明系统的多自由度均匀性校正方法[J]. 光学学报, 2018, 38(10): 1022004