中国激光, 2018, 45 (11): 1100001, 网络出版: 2018-11-15
13.5 nm放电Xe等离子体极紫外光源 
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13.5 nm Extreme Ultraviolet Light Source Based on Discharge Produced Xe Plasma
X射线光学 极紫外光源 放电等离子体 极紫外光刻 X-ray optics EUV light source discharge produced plasma Xe Xe EUV lithography
摘要
搭建了极紫外光源实验装置，获得了中心波长为13.5 nm的Xe等离子体极紫外的辐射光谱。测量了极紫外辐射的时间特性，用多次箍缩理论解释了光脉冲的多峰结构。获得了主脉冲电流幅值、Xe气流量、陶瓷管内径、等离子体长度、辅助气体等实验参数对极紫外辐射强度的影响规律。搭建了重复频率为1 kHz的13.5 nm极紫外光源样机，介绍了样机的电源系统、放电系统、去碎屑系统和光收集系统的基本情况，并给出了光源样机的调试结果。
Abstract
The experimental setup of an extreme ultraviolet (EUV) light source is built. The EUV radiation spectrum with a central wavelength of 13.5 nm from the Xe plasma is obtained and the temporal characteristics are characterized. The multi-peak structure of a light pulse is clarified by the multiple pinch theory. The influence laws of the experimental parameters such as the current amplitude of main pulse, Xe flow rate, inner diameter of ceramic tube, plasma length, and auxiliary gas on EUV radiation intensity are obtained. In addition, a prototype of 13.5 nm EUV light source with a repetition rate of 1 kHz is built and its power supply system, discharge system, debris mitigation tool and collector system are described. The test results about the prototype are also given.
赵永蓬, 徐强, 李琦, 王骐. 13.5 nm放电Xe等离子体极紫外光源[J]. 中国激光, 2018, 45(11): 1100001. Zhao Yongpeng, Xu Qiang, Li Qi, Wang Qi. 13.5 nm Extreme Ultraviolet Light Source Based on Discharge Produced Xe Plasma[J]. Chinese Journal of Lasers, 2018, 45(11): 1100001.
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