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荧光成像技术探测熔石英元件亚表面缺陷

Subsurface Defects in Fused Silica Elements Detected by Fluorescence Imaging Technology

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摘要

提出荧光成像技术用于无损探测熔石英光学元件亚表面缺陷, 利用该方法获得不同加工工艺下熔石英光学元件的亚表面缺陷。结合熔石英光学元件损伤性能研究, 分析了熔石英光学元件亚表面缺陷与其损伤性能的关联关系。结果表明, 熔石英光学元件损伤阈值与荧光缺陷密度呈反比关系, 即亚表面荧光缺陷较少的样品损伤性能较好。这说明利用该技术方法可以有效评价熔石英光学元件的损伤性能。该研究结果对光学元件加工技术具有指导意义。

Abstract

The fluorescence imaging technology is proposed for non-destructive detection of subsurface defects of fused silica optical elements. The subsurface defects of fused silica optical elements under different processing techniques are obtained by this method. Based on the damage properties of fused silica optical elements, the relationship between subsurface defects and damage properties of fused silica optical elements is analyzed. The results show that the damage threshold of fused silica optical elements is inversely proportional to the density of fluorescent defects, that is the samples with less subsurface fluorescence defects have high damage threshold. This shows that the technique can effectively evaluate the damage performance of fused silica optical elements. The results of this study have guiding significance for optical element processing technology.

Newport宣传-MKS新实验室计划
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中图分类号:O434.2

DOI:10.3788/lop56.011004

所属栏目:图像处理

基金项目:西南科技大学龙山学术人才科研支持计划(17LZX505)

收稿日期:2018-06-21

修改稿日期:2018-07-12

网络出版日期:2018-07-18

作者单位    点击查看

李洪路:西南科技大学材料科学与工程学院, 四川 绵阳 621900
刘红婕:中国工程物理研究院激光聚变研究中心, 四川 绵阳 621900
蒋晓东:中国工程物理研究院激光聚变研究中心, 四川 绵阳 621900
黄进:中国工程物理研究院激光聚变研究中心, 四川 绵阳 621900
曹林洪:西南科技大学材料科学与工程学院, 四川 绵阳 621900

联系人作者:蒋晓东(jiangxiaodong@163.com); 曹林洪(hyclh@yeah.net);

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引用该论文

Li Honglu,Liu Hongjie,Jiang Xiaodong,Huang Jin,Cao Linhong. Subsurface Defects in Fused Silica Elements Detected by Fluorescence Imaging Technology[J]. Laser & Optoelectronics Progress, 2019, 56(1): 011004

李洪路,刘红婕,蒋晓东,黄进,曹林洪. 荧光成像技术探测熔石英元件亚表面缺陷[J]. 激光与光电子学进展, 2019, 56(1): 011004

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