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阴离子改性抛光剂对磷酸盐激光钕玻璃抛光的影响

Effect of Anionic Modified Polishing Agent on Nd-Doped Phosphate Laser Glass Polishing

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摘要

为了改善氧化铈抛光液的性能,在不破坏钕玻璃表面质量的前提下提高钕玻璃的抛光效率,选择在氧化铈抛光液中加入阴离子表面活性剂雷米邦A,并研究了改性后的抛光液对氧化铈抛光液中粒子粒径、钕玻璃的材料去除率和抛光后钕玻璃表面质量的影响,分析了加入不同质量分数雷米邦A的抛光液在不同pH值下对钕玻璃抛光速率和抛光质量的影响。结果表明:雷米邦A能够抑制抛光液中纳米粒子的团聚,降低氧化铈的中位粒径,提高抛光效率。当二氧化铈质量分数为3%、pH为6.5、雷米邦A质量分数为0.30%时,材料去除率达到最大值169 nm/min;当二氧化铈质量分数为3%、pH为7、雷米邦A质量分数为0.20%时,钕玻璃的表面粗糙度达到最小值0.9 nm。

Abstract

To enhance the performance of cerium oxide polishing slurry and improve the polishing efficiency of Nd-glass without destroying the surface quality of Nd-glass, anionic surfactant Lamepon A was chosen to be added to the cerium oxide polishing slurry. In this work, the effects of the modified polishing slurry on the particle size of the cerium oxide polishing slurry, material removal rate of Nd-glass, and surface quality of Nd-glass after polishing were studied. The effect of pH of polishing slurry with different mass fraction of Lamepon A on the polishing rate and quality of Nd-glass were also studied. The results show that Lamepon A can inhibit the agglomeration of nanoparticles in the polishing slurry, reduce the median diameter of cerium oxide, and improve the polishing efficiency. When the mass fraction of the cerium oxide is 3%, the pH is 6.5, and mass fraction of Lamepon A is 0.30%, the material removal rate attains a maximum value of 169 nm/min; when the mass fraction of the cerium oxide is 3%, the pH is 7, the mass fraction of Lamepon A is 0.20%, the surface roughness reaches a minimum of 0.9 nm.

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中图分类号:TG356.28

DOI:10.3788/CJL202047.1003001

所属栏目:材料与薄膜

基金项目:国家自然科学基金、上海市“科技创新行动计划”;

收稿日期:2020-04-03

修改稿日期:2020-05-06

网络出版日期:2020-10-01

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刘伯勋:上海科技大学物质科学与技术学院, 上海201210中国科学院上海光学精密机械研究所高功率激光物理联合实验室, 上海 201800中国科学院中国工程物理研究院高功率激光物理联合实验室, 上海 201800
焦翔:中国科学院上海光学精密机械研究所高功率激光物理联合实验室, 上海 201800中国科学院中国工程物理研究院高功率激光物理联合实验室, 上海 201800
谭小红:中国科学院上海光学精密机械研究所高功率激光物理联合实验室, 上海 201800中国科学院中国工程物理研究院高功率激光物理联合实验室, 上海 201800
朱健强:上海科技大学物质科学与技术学院, 上海201210中国科学院上海光学精密机械研究所高功率激光物理联合实验室, 上海 201800中国科学院中国工程物理研究院高功率激光物理联合实验室, 上海 201800

联系人作者:朱健强(jqzhu@mail.shcnc.ac.cn)

备注:国家自然科学基金、上海市“科技创新行动计划”;

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引用该论文

Liu Boxun,Jiao Xiang,Tan Xiaohong,Zhu Jianqiang. Effect of Anionic Modified Polishing Agent on Nd-Doped Phosphate Laser Glass Polishing[J]. Chinese Journal of Lasers, 2020, 47(10): 1003001

刘伯勋,焦翔,谭小红,朱健强. 阴离子改性抛光剂对磷酸盐激光钕玻璃抛光的影响[J]. 中国激光, 2020, 47(10): 1003001

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