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Opto-Electronic Advances 第3卷 第4期

Kaihua Dou 1,2Xin Xie 1,2Mingbo Pu 1,2Xiong Li 1,2[ ... ]Xiangang Luo 1,2,*
Author Affiliations
Abstract
1 State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academyof Sciences, Chengdu 610209, China
2 School of Optoelectronics, University of Chinese Academy of Sciences, Beijing 100049, China
Dispersion control is crucial in optical systems, and chromatic aberration is an important factor affecting imaging quality in imaging systems. Due to the inherent property of materials, dispersion engineering is complex and needs to trade off other aberration in traditional ways. Although metasurface offers an effective method to overcome these limits and results in well-engineered dispersion, off-axis dispersion control is still a challenging topic. In this paper, we design a single-layer metalens which is capable of focusing at three wavelengths (473 nm, 532 nm, and 632 nm) with different incident angles (0°, -17° and 17°) into the same point. We also demonstrate that this metalens can provide an alternative for the bulky color synthetic prism in a 3-chips digital micromirror device (DMD) laser projection system. Through this approach, various off-axis dispersion controlling optical devices could be realized.
off-axis dispersion control metalens color imaging 
Opto-Electronic Advances
2020, 3(4): 04190005
Author Affiliations
Abstract
1 Department of Electrical and Computer Engineering, University of Texas at Arlington, Arlington, Texas 76019, United States
2 Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States
3 HexaTech, Inc., 991 Aviation Parkway, Suite 800, Morrisville, North Carolina 27560, United States
4 Department of Electrical and Computer Engineering, Michigan State University, East Lansing, Michigan 48824, United States
We report here an optically pumped deep UV edge emitting laser with AlGaN multiple quantum wells (MQWs) active region grown on AlN substrate by low pressure organometallic vapor phase epitaxy (LP-OMVPE) in a high-temperature reactor. The 21 period Al0.53Ga0.47N/Al0.7Ga0.3N MQWs laser structure was optically pumped using 193 nm deep UV excimer laser source. A laser peak was achieved from the cleaved facets at 280.3 nm with linewidth of 0.08 nm at room temperature with threshold power density of 320 kW/cm2. The emission is completely TE polarized and the side mode suppression ratio (SMSR) is measured to be around 14 dB at 450 kW/cm2.
optically pumped AlGaN UV edge emitting laser AlN substrate 
Opto-Electronic Advances
2020, 3(4): 04190025
Author Affiliations
Abstract
1 Key Laboratory of Optoelectronic Materials Chemistry and Physics, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou 350002, China
2 University of Chinese Academy of Sciences, Beijing 100049, China
3 Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, 117576, Singapore
We explored Q-switching mechanism for the newly proposed Tm/Ho composite laser via developing a hybrid resonator for separating the intra-cavity Tm laser modulated by the saturable absorber (SA). With a Cr:ZnSe SA, successful passively Q-switching process with the maximum average output power of 474 mW and the shortest pulse width of 145 ns were obtained at the pulse repetition frequency of 7.14 kHz, where dual wavelength oscillation in both 2090 nm and 2097 nm was observed. This work provides an effective way for a direct laser diode (LD) pumped Q-switched Ho laser, which is compact and accessible. Furthermore, the current SA could be replaced by the 2D materials with broadband saturable absorption such as topological insulators or transition-metal dichalcogenides for seeking novel PQS lasers.
Ho laser Tm laser Tm/Ho composite passively Q-switched Cr:ZnSe 
Opto-Electronic Advances
2020, 3(4): 04190031

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