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摘要

An approach for determining the optical constants of the weakly absorbing substrate is developed and applied to obtain the parameters of CaF2 and fused silica substrates in deep ultraviolet (DUV) and vacuum ultraviolet (VUV) range. A method for extracting the optical constants of thin films deposited on strongly absorbing substrate, which is based on the reflectance spectra mea

PDF全文 Chinese Optics Letters | 2013,11(s1):S10607
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0 432 1351

摘要

The multilayer (ML) mirror with high-reflectivity (HR) at a specific emission line of 19.5 nm (Fe line) and low-reflectivity (LR) at 30.4 nm (He line) is needed to be designed and fabricated for observing the image of sun. Based on a variety of optimizations utilized different structures, the design is performed and the final results demonstrate that the reflectivity at 30.4 nm

PDF全文 Chinese Optics Letters | 2013,11(s1):S10606
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0 0 1121

摘要

Random thickness error is an important factor which effects the calibration accuracies of deposition rates for extreme ultraviolet (EUV) multilayer coatings fabricated by sputter deposition techniques. A least square fitting method is proposed to determine deposition rates and extract random thickness errors accurately. The validity of this method is shown by evaluating two dep

PDF全文 Chinese Optics Letters | 2013,11(s1):S10605
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0 0 1230

摘要

We use interface engineering technology to obtain high interface quality of extreme ultraviolet (EUV) multilayer. By inserting ultrathin (<0.5 nm) B4C layer between Mo and Si layers in Mo/Si multilayer, the interdiffusion in the multilayer is decreased obviously and the reflectivity can be estimated to increase by 2%. By inserting a new inert material barrer between Mo and S

PDF全文 Chinese Optics Letters | 2013,11(s1):S10604
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0 0 1199

摘要

We report on the optical performance, structure and thermal stability of periodic multilayer films containing Zr and Al(1wt.-%Si) or Al(pure) layers designed for the use as extreme ultraviolet (EUV) high reflective mirrors in the range of 17–19 nm. The comparison of Al/Zr (Al(1wt.-%Si)/Zr and Al(pure)/Zr) multilayers fabricated by direct–current magnetron sputtering shows tha

PDF全文 Chinese Optics Letters | 2013,11(s1):S10603
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0 0 1449

摘要

It is well known that the optical property of an optical thin film can be influenced by even small inhomogeneity of refractive index (RI). In order to investigate the RI inhomogeneity of LaF3 single layer in deep ultraviolet (DUV) range, single-layer LaF3 samples deposited on fused silica and CaF2 substrates are prepared by resistive heating evaporation at different deposition

PDF全文 Chinese Optics Letters | 2013,11(s1):S10602
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0 375 1212

摘要

We use complementary analysis techniques to determine the structure of nanometric periodic multilayers and particularly their interfaces. We focus on Co-based multilayer which can be used as efficient optical component in the extreme ultraviolet (EUV) range. The samples are characterized using reflectivity measurements in order to determine the thickness and roughness of the va

PDF全文 Chinese Optics Letters | 2013,11(s1):S10601
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0 470 1449
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