引用该论文

Zhao Yongpeng,Xu Qiang,Li Qi,Wang Qi. 13.5 nm Extreme Ultraviolet Light Source Based on Discharge Produced Xe Plasma[J]. Chinese Journal of Lasers, 2018, 45(11): 1100001

赵永蓬,徐强,李琦,王骐. 13.5 nm放电Xe等离子体极紫外光源[J]. 中国激光, 2018, 45(11): 1100001