离子束溅射制备Nb2O5、Ta2O5和SiO2薄膜的光学、力学特性和微结构 |
袁文佳, 沈伟东, 郑晓雯, 杨陈楹, 章岳光, 方波, 沐雯, 陈超楠, 刘旭 |
Optical and Mechanical Properties and Microstructures of Nb2O5, Ta2O5 and SiO2 Thin Films Prepared by Ion Beam Sputtering |
波长为550 nm时,以EBE、IBAD和IBS三种方式制备的不同薄膜的光学常数。(a) Nb2O5; (b) Ta2O5; (c) SiO2 |
Optical constants of different thin films prepared by different methods of EBE, IBAD and IBS when wavelength is 550 nm.(a) Nb2O5; (b) Ta2O5; (c) SiO2 |