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离子束溅射制备Nb2O5、Ta2O5和SiO2薄膜的光学、力学特性和微结构
袁文佳, 沈伟东, 郑晓雯, 杨陈楹, 章岳光, 方波, 沐雯, 陈超楠, 刘旭

Optical and Mechanical Properties and Microstructures of Nb2O5, Ta2O5 and SiO2 Thin Films Prepared by Ion Beam Sputtering
Yuan Wenjia, Shen Weidong, Zheng Xiaowen, Yang Chenying, Zhang Yueguang, Fang Bo, Mu Wen, Chen Chaonan, Liu Xu
以EBE、IBAD和IBS三种沉积方式制备的不同薄膜的应力值。(a) Nb2O5; (b) Ta2O5; (c) SiO2       

Stress value of different thin films prepared by three deposition methods of EBE, IBAD and IBS.(a) Nb2O5; (b) Ta2O5; (c) SiO2