400 mm口径片状放大器增益性能退化是国内外惯性约束聚变（ICF）激光装置长期运行所面临的主要问题之一，直接影响激光装置的输出能力与光束质量。对造成片状放大器增益退化的因素开展了分析，建立了各因素的归一化理论分析模型，并利用2组九片长的400 mm口径4×2组合式片状放大器系统开展了实验研究，无维护策略条件下经过10年、3 000发次运行后增益性能平均退化了10.2%，符合理论预期。以此制定了大口径片状放大器的维护策略，实现了系统长期的增益性能退化率优于1.5%，满足ICF激光装置长期运行要求。

细菌感染会造成伤口愈合延迟，增加患者和医疗卫生系统的负担，因此非常需要对伤口细菌进行及时检测和适当的处理。基于细菌自发荧光原理，设计了一种对伤口常见细菌快速检测成像的系统，可用于辅助识别伤口细菌负荷和判断感染情况，无需采样培养或染色鉴定。使用智能手机采集细菌荧光图像，以405 nm LED作为细菌激发光源，配合荧光图像信息提取和定量算法能够快速识别提取图像上的感兴趣区域并对荧光信号进行量化，定位细菌荧光信号区域。梯度浓度实验证实了荧光强度与细菌浓度高度相关，荧光强度与浓度之间存在线性关系，随着细菌浓度的降低，荧光信号强度呈下降趋势，系统最小检测限约为10⁵ CFU/mL。与传统细菌检测方法相比，本装置具有操作简单、检测速度快、成本低等特点，为伤口细菌检测提供了一种新的手段。

在氙灯放电泵浦过程中, 片状放大器片腔内材料在高强度氙灯光辐照下, 存在显著的热解过程, 产生大量的μm级悬浮粒子。针对放大器在线洁净度控制，采取了包括选用有利于洁净控制的材料、消除盲孔与焊缝、深度酸洗刻蚀、高压喷淋清洗和最终的光照清洗等系列有效措施。实验研究结果表明：经过100发次光照清洗，片腔内气溶胶颗粒处于300～1000之间，接近美国国家点火装置(NIF)洁净水平；发次运行完成后，利用约0.4 m/s的氮氧混合气体对放大器腔体进行吹扫，气溶胶颗粒在2 min内可恢复至0值。

为更快速地置换片状放大器片箱内部的气体、带走片箱内部因氙灯辐照产生的μm级气溶胶颗粒，以延长钕玻璃增益介质使用寿命，提出了几种不同的片箱隔板气体流道设计并对其吹扫效果进行对比。基于计算流体力学手段和分散相模型，求解了片箱腔内的吹扫流场并模拟了微米级粒子污染物的吹扫过程。片箱隔板采用开孔设计，通过对比分析发现，不同开孔孔径和排列方式的片箱吹扫效果差异明显。当开孔孔径为ϕ14 mm、且上下隔板都采用整齐排列的圆形通孔时，片箱内的气体压力损失更小（424.3 Pa）且吹扫达到百级的时间更短（205 s）。最后片箱吹扫实验显示了采用该结构的片箱其腔内吹扫达到百级的时间为2～3 min。

Overview: Two-photon lithography (TPL) has been a research hotspot in 3D micro/nano writing technology due to its characteristics of high resolution, low thermal influence, a wide range of processed materials, low environmental requirements, and 3D processing capability. It has shown unique advantages in the fields of life science, material engineering, micro/nano optics, microfluidic, micro machinery, and so on. This paper summarizes the research works done by researchers on different writing methods to improve TPL processing efficiency. Single-beam writing is the main method for TPL, which mainly depends on the speed of the scanning device. Single-beam writing has the advantages of simple system and high-quality beam, and it is easy to combine various effects to improve writing results. It mainly includes scanning modes based on the translation stage, galvo, polygon laser scanner, and acousto-optic deflector (AOD) (Fig. 2). All these modes have advantages and disadvantages. As for the scanning speed comparison, polygon laser scanner and AOD have relatively faster writing rates (faster than m/s). Multi-foci parallel lithography can obviously promote efficiency, elevating the speed by dozens or even hundreds of thousands of times, mainly based on spatial light modulator (SLM), digital micromirror device (DMD), microlens array (MLA), diffractive optical elements (DOE), multi-beam interference, and so on (Figs. 3-15). Multi-foci parallel lithography based on SLM is most widely used owing to its high efficiency and ability to flexible and independent control of each single beam, but the refresh rate is still insufficient. DMD has a higher refreshing rate (32 kHz), but the state-of-the-art beam parallelism realized by DMD is severely limited. More parallel beams are further required for improving the processing efficiency. The 2D pattern exposure method based on SLM or DMD can further improve the TPL efficiency with the superiority of generating flexibly designed pattern (Figs. 16-18). However, the 2D projection exposure technology is still difficult to achieve high writing precision, especially the axial resolution. An available method to improve the axial precision is spatially and temporally focusing an ultrafast laser to implement a strong intensity gradient at the spatial focal plane that restricts polymerization within a thin layer. The 3D projection method will be the most efficient writing method in the future, especially in 3D device processing (Figs. 19-20). Researchers used this technique to make hollow tubular and conical helices structures, increasing the processing speed by 600 times. However, the research results show that the current 3D projection can only process simple 3D structures. Further researches on 3D exposure processing of complex structures are expected, which will effectively expand its application in various fields. Authors believe that with the effort of researchers on efficiency improvement gradually, TPL can further highlight its advantages to promote the development of life science, materials engineering, micro-nano optics, and many other fields.