We present a unified electromagnetic modeling of coherence scanning interferometry, confocal microscopy, and focus variation microscopy as the most common techniques for surface topography inspection with micro- and nanometer resolution. The model aims at analyzing the instrument response and predicting systematic deviations. Since the main focus lies on the modeling of the microscopes, the light–surface interaction is considered, based on the Kirchhoff approximation extended to vectorial imaging theory. However, it can be replaced by rigorous methods without changing the microscope model. We demonstrate that all of the measuring instruments mentioned above can be modeled using the same theory with some adaption to the respective instrument. For validation, simulated results are confirmed by comparison with measurement results.

脉冲压缩光栅是实现高能量激光的核心光学元器件，其制造过程中产生的表面污染物和微结构缺陷成为限制高功率激光系统发展的技术瓶颈，为了提升光栅的激光诱导损伤阈值，提出利用磁性复合流体进行脉冲压缩光栅（PCG）后处理抛光研究。对抛光前后光栅样品的微观结构，表面形貌、表面粗糙度、衍射效率和激光诱导损伤阈值等参数进行测量，进行抛光前后光栅表面质量和光栅性能的评估。研究发现，磁性复合流体抛光能够在不破坏实际光栅结构的前提下抑制加工过程产生的毛刺，微结构缺陷等；经3 min抛光后，光栅顶部表面粗糙度从21.36 nm下降到3.73 nm；激光诱导损伤阈值从2.8 J/cm²提高到3.8 J/cm²，抗激光损伤性能提升35.7%，且不影响衍射效率。实验结果表明：磁性复合流体抛光是一种可以提高光栅元件表面质量，提升光栅元件光学性能的有效方法。