激光与光电子学进展, 2022, 59 (9): 0922019, 网络出版: 2022-05-10  

面向光刻机晶圆台的超精密光栅定位技术 下载: 3321次特邀综述

Ultraprecision Grating Positioning Technology for Wafer Stage of Lithography Machine
作者单位
1 清华大学深圳国际研究生院,广东 深圳 518055
2 清华-伯克利深圳学院,广东 深圳 518055
摘要

光栅干涉仪凭借高精度和高鲁棒性,成为先进节点光刻机中的重要定位装置。针对14 nm及以下节点光刻机晶圆台的定位需求,综述了多自由度纳米/亚纳米测量精度的零差式和外差式光栅干涉仪的发展,并介绍了“四光栅-四读数头”的光刻机六自由度位移测量系统布局。为了获得更高的精度和可溯源性,综合分析了光栅干涉仪中的环境误差、安装误差和仪器内在误差,并提出了光栅干涉仪实现亚纳米测量精度的关键问题,期望为光栅干涉仪精度提升和系统搭建提供初步指导。

Abstract

Grating interferometers are becoming important positioning instruments in advanced node lithography machines owing to their high precision and robustness. To meet ultrahighly accurate positioning demands in the worktable of ≤14-nm node lithography machines, homodyne and heterodyne grating interferometry technologies and core systems with multidegree-of-freedom (multi-DOF) and nano/subnanometer metric accuracy were reviewed. Furthermore, a six-DOF positioning system in a current lithography machine enabled by an optimal configuration of “four gratings-four reading heads” was illustrated. Finally, errors in grating interferometers, including environmental error, installation error, and instrument inherent error were briefly discussed, and key challenges in error modeling, separation, and compensation were reviewed for achieving subnanometric accuracy and long-term accuracy stability. Hopefully, this study can provide preliminary guidelines for improving the accuracy and constructing various systems of grating interferometers.

朱俊豪, 汪盛通, 李星辉. 面向光刻机晶圆台的超精密光栅定位技术[J]. 激光与光电子学进展, 2022, 59(9): 0922019. Junhao Zhu, Shengtong Wang, Xinghui Li. Ultraprecision Grating Positioning Technology for Wafer Stage of Lithography Machine[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922019.

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