光学学报, 2021, 41 (7): 0716001, 网络出版: 2021-04-11   

ZnO纳米墙的电化学沉积法制备及紫外探测性能分析 下载: 832次

Fabrication of ZnO Nanowalls by Electrochemical Deposition and Ultraviolet Detection Performance
作者单位
1 西安邮电大学电子工程学院, 陕西 西安 710121
2 西安邮电大学理学院, 陕西 西安 710121
摘要
以硝酸锌水溶液作为电沉积液,采用电化学沉积法制备了氧化锌(ZnO)纳米墙,研究了沉积电压对其表面形貌、晶体结构、拉曼光谱、光致发光谱、透过率以及紫外探测性能的影响。实验结果表明,该方法制备的ZnO纳米墙的均匀性较好,具有纤锌矿结构,沿(002)晶面择优生长,有较明显的E2(high)模峰,在394 nm处有较强烈的紫外激发峰。紫外探测实验表明:在紫外光照射下,ZnO纳米墙的光电流迅速达到饱和,当沉积电压为1.6 V时,ZnO纳米墙的光电流值最大,对应的响应时间和恢复时间分别为1.36 s和2.23 s;当测试偏压为5 V时,光暗电流比为38.96,光电响应度为0.611 A/W。
Abstract
In the paper, zinc nitrate aqueous solution is used as electrodeposition solution to prepare zinc oxide (ZnO) nanowalls by the electrochemical deposition method. The effects of deposition voltage on the surface morphology, crystalline structure, Raman spectrum, photoluminescence spectrum, transmittance and ultraviolet detection performance are investigated. The experimental results show that the ZnO nanowalls fabricated by the proposed method have rather good uniformity, exhibit a wurtzite structure, grow preferentially along the (002) crystal plane, and have an obvious E2(high) mode peak. In addition, the ZnO nanowalls have a strong ultraviolet excitation peak at 394 nm. The ultraviolet detection experiments show that the photocurrent of ZnO nanowalls quickly reaches saturation under the irradiation of ultraviolet light and has the maximum value at the deposition voltage of 1.6 V. The corresponding response time and recovery time are 1.36 s and 2.23 s, respectively. The photo-to-dark current ratio is 38.96 and the photoelectric responsivity is 0.611 A/W at the bias voltage of 5 V.

商世广, 高浪, 任卫, 张文倩, 王睿. ZnO纳米墙的电化学沉积法制备及紫外探测性能分析[J]. 光学学报, 2021, 41(7): 0716001. Shiguang Shang, Lang Gao, Wei Ren, Wenqian Zhang, Rui Wang. Fabrication of ZnO Nanowalls by Electrochemical Deposition and Ultraviolet Detection Performance[J]. Acta Optica Sinica, 2021, 41(7): 0716001.

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