提出酶蚀卤化银明胶制作连续深浮雕微结构的新方法。给出了卤化银明胶酶蚀成像原理和深刻蚀过程机理的理论分析。求得存在吸收时，刻蚀深度与曝光量关系的解析式。表明胶膜对光的吸收是造成其非线性关系的主要原因，并提出了解决方案和优化工艺参数，通过实验得到在刻蚀深度为4 μm范围内有良好的线性关系，最后成功制作了良好面形的微柱透镜列阵。

A new method to fabricate continuous deep relief microstructure with enzyme-etching silver halide gelatin is proposed. Imaging principle of silver halide gelatin with enzyme etching and theoretical analysis of deep etching process are given, and the relationship between etching depth and exposure with absorption is solved. It shows that the nonlinearity of etching process is caused mainly by absorption of emulsion to light. The solving scheme to the nonlinearity and the optimum technique parameters of this process are presented to achieve the good linear relationship in relief depth of 4 μm by experiment. At last, the fabrication of micro cylindrical lens array with good profile has been achieved.