应用激光, 2002, 22 (4): 405, 网络出版: 2006-05-10
紫外激光刻蚀氧化锆陶瓷初步研究
Etching of ZrO2 ceramic with UV laser ablation
摘要
描述了KrF准分子激光对氧化锆陶瓷的微刻蚀实验,研究了脉冲刻蚀深度与脉冲数的关系(刻蚀速率),刻蚀的槽的形貌,并进行了刻蚀小孔的初步研究,得到直径为40μm,深度为25μm的微孔矩阵.为KrF激光对该材料的加工提供实验数据.
Abstract
The experiment of micro-ablation of ZiO_2 ceramic by KrF excimer laser is described in this paper. The relationship between etching depth and laser pulse number, and the morphology of etching groove are investigated. The micro-holes with 40(m diameter and 25(m deepness are obtained. The results give the fundamental data for KrF laser ceramic processing.
凌磊, 楼祺洪, 叶震寰, 董景星, 魏运荣. 紫外激光刻蚀氧化锆陶瓷初步研究[J]. 应用激光, 2002, 22(4): 405. 凌磊, 楼祺洪, 叶震寰, 董景星, 魏运荣. Etching of ZrO2 ceramic with UV laser ablation[J]. APPLIED LASER, 2002, 22(4): 405.
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