从理论上和实验上对硅镜的热变形的动态过程作了研究。在变形之初硅镜表面的位移变化很快。在注入激光功率为200 W,硅镜的吸收率为70%时,φ70×8 mm硅镜在注入激光功率2 s后热应力引起的挠变形就达到0.76 μm。这对于高功率短波长激光器是一个不容忽视的问题。

The dynamic process of the thermal distortion of the silicon mirror has been studied theoretically and experimentally. The displacement of the suface of the silicon mirror is varying rapidly in the beginning of the distortion. When the power of the incident laser is 200 W and the absorptivity of the silicon mirror is 70%, after two seconds the deflection of the mirror introduced by thermal stresses reachs 0.76 μm already. It is not a megligible problem for the high power short wavelength laser.