光学学报, 1997, 17 (3): 331, 网络出版: 2006-10-31
XeCl(308 nm)脉冲准分子激光淀积类金刚石薄膜
Pulsed Laser Deposition of Diamond Like Carbon Film with XeCl (308 nm) Laser
摘要
利用XeCl(308 nm)脉冲准分子激光淀积技术在功率密度5×108 W/cm2、室温、真空度10-3Pa的条件下,制备出不含氢成分的类金刚石薄膜,研究了类金刚石薄膜的特性及其随制备工艺条件的变化规律。研究了激光诱导的碳等离子体发射光谱,探讨了类金刚石薄膜的形成机理。
Abstract
Hydrogen free Diamond Like Carbon (DLC) films have been deposited by XeCl(308 nm) pulsed laser ablation of graphite targets with a base pressure of only 1×10 -3 Pa. The deposition process is performed with a laser power density of 5×10 8 W/cm 2 at room temperature. Properties of the films and the effects of a variety of process parameters on the film properties have been investigated. The emission spectra of laser induced plasma and the key factors in the process of DLC film deposition are discussed.
李铁军, 刘晶儒, 王丽戈. XeCl(308 nm)脉冲准分子激光淀积类金刚石薄膜[J]. 光学学报, 1997, 17(3): 331. 李铁军, 刘晶儒, 王丽戈. Pulsed Laser Deposition of Diamond Like Carbon Film with XeCl (308 nm) Laser[J]. Acta Optica Sinica, 1997, 17(3): 331.
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