本文介绍了紫外纳米压印技术原理,以及工艺中模板与基片的平行度对压印质量的影响。研制了气囊气缸式真空紫外纳米压印设备,其通过气囊气缸使模板与基片平行,从而可在大面积基片上确保压力均匀。研制了相应的光学系统,着重讨论了如何实现紫外纳米压印以及光学系统的设计和调整。制备了石英玻璃模板,实现了在商用紫外固化聚合物OG154上的紫外纳米压印,转移复制了具有100nm特征的5cm×5cm面积的纳米结构图形。

The principle of UV nanoimprint lithography (UV-NIL) and the effect of the parallelism between the stamp and substrate on the imprint quality were introduced.Bellows cylinder vacuum UV nanoimprint lithography machine was developed,which could place stamp and substrate parallel to each other through bellows cylinder,and transferred the pressing force to a large area substrate effectively and uniformly.With the design of the optical system,the implementation of UV nano-imprinting lithography and the optical system’s construction and adjustment were analyzed.UV nanoimprint lithography for Polymer OG154 was implemented.Printing results of 100 nm features over a 5cm×5cm area were presented.