摘要

光刻机光瞳整形普遍采用衍射光学元件(DOE)来产生各种照明模式。针对其光学特性的检测需求，提出了一种光刻机光瞳整形DOE远场多参数检测方法。该方法通过对远场光强分布进行转换，可同时获得DOE远场衍射图样的极平衡性、极张角、极方位角、半孔径角和径向光强分布等多种光学特性参数。实验中，对国外加工的产生四极照明模式的DOE进行了远场多参数检测与分析，结果表明该方法可以满足光刻机光瞳整形DOE的检测要求。

Abstract

Diffractive optical element (DOE) is widely used to generate various illumination modes for pupil shaping in the lithography system. A far-field multi-parameter measuring method for the DOE is proposed according to its testing requirements of optical performance. The multi-parameters of optical performance, such as the pole balance, the pole opening angle, the pole azimuth angle, the semi-aperture angle, and the radial intensity distribution are obtained simultaneously by converting the far-field intensity distribution. The multi-parameter measurement and analysis of DOE made abroad are done experimentally. And the experimental results indicate that this measuring method can be applied to the testing of DOE for pupil shaping in the lithography system.

补充资料

中图分类号：O438

DOI：10.3788/cjl201340.0908001

所属栏目：测量与计量

基金项目：国家国际科技合作项目(2011DFR10010)、国家科技重大专项课题(2011ZX02402)

收稿日期：2013-03-28

修改稿日期：2013-04-22

网络出版日期：--

作者单位    点击查看

联系人作者：胡中华(huzhonghua@siom.ac.cn)

备注：胡中华(1984—)，男，博士研究生，主要从事高数值孔径光学光刻技术方面的研究。

【1】Hu Zhonghua, Yang Baoxi, Zhu Jing, et al.. Pupil shaping techniques in high resolution projection exposure tools[J]. Laser & Optoelectronics Progress, 2011, 48(11): 111101.
胡中华, 杨宝喜, 朱菁, 等. 高分辨率投影光刻机光瞳整形技术[J]. 激光与光电子学进展, 2011, 48(11): 111101.

【2】Wang Jun, Jin Chunshui, Wang Liping, et al.. Study on the off-axis illumination for extreme ultraviolet lithography[J]. Acta Optica Sinica, 2012, 32(12): 1211003.
王君, 金春水, 王丽萍, 等. 极紫外光刻离轴照明技术研究[J]. 光学学报, 2012, 32(12): 1211003.

【3】Xing Shasha, Wu Rengmao, Li Haifeng, et al.. Freeform-surface design of off-axis illumination in projection lithography[J]. Acta Optica Sinica, 2011, 31(3): 0322002.
邢莎莎, 吴仍茂, 李海峰, 等. 应用于投影光刻离轴照明的自由曲面设计[J]. 光学学报, 2011, 31(3): 0322002.

【4】Zhang Wei, Gong Yan. Vector analysis of diffractive optical elements for off-axis illumination of projection lithographic system[J]. Acta Optica Sinica, 2011, 31(10): 1005002.
张巍, 巩岩. 投影光刻离轴照明用衍射光学元件的矢量分析[J]. 光学学报, 2011, 31(10): 1005002.

【5】Zhang Wei, Gong Yan. Design of diffractive optical elements for off-axis illumination in projection lithography［J］. Optics and Precision Engineering, 2008, 16(11): 2081-2086.
张巍, 巩岩. 投影光刻离轴照明用衍射光学元件设计［J］. 光学 精密工程, 2008, 16(11): 2081-2086.

【6】John E Childers, Tom Baker, Marc D Himel, et al.. Advanced testing requirements of diffractive optical elements for off-axis illumination in photolithography[C]. SPIE, 2009, 7430: 74300S.

【7】Marc D Himel, Robert E Hutchins, Jamey C Colvin. Design and fabrication of customized illumination patterns for low-k1 lithography: a diffractive approach[C]. SPIE, 2001, 4346: 1436-1442.

引用该论文

Hu Zhonghua,Zhu Jing,Yang Baoxi,Pen Xuefeng,Zeng Aijun,Huang Huijie. Far-Field Multi-Parameter Measurement of Diffractive Optical Element for Pupil Shaping in Lithography System[J]. Chinese Journal of Lasers, 2013, 40(9): 0908001

胡中华,朱菁,杨宝喜,彭雪峰,曾爱军,黄惠杰. 光刻机光瞳整形衍射光学元件远场多参数检测方法[J]. 中国激光, 2013, 40(9): 0908001

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