采用低温等离子体辅助气相沉积技术在低压常温条件下制备稳定的纳米铝膜。利用发射光谱和Langmuir双探针法分析射频感应耦合Ar等离子体成分及分布密度特性,结果显示在衬底附近等离子体密度衰减趋于平缓且均匀,浮动电位0.329 V;随着功率的增加,Ar+对成膜起主要影响。再结合铝膜的原子力显微结构,研究了不同的等离子环境条件对成膜质量及其紫外可见光谱的光学性质影响。结果表明射频离子源的加入,薄膜微结构发生较明显变化;随功率增加,膜反射率出现峰值;微结构特性对其光学性能影响较大,随着表面粗糙度的增加,紫外及可见光的透射率先减小后增大。

Nanometer aluminum film with low-temperature plasma assisted vapor deposition technique for were prepared. In the use of emission spectra and Langmuir double probe method analysis of RF inductively coupled Ar plasma, results are displayed in the substrate near that the plasma density tends to be smooth and uniform, and floating potential is 0.329 V . With the increase in power, Ar+ plays a major influence on the film. By the combination of atomic force microscopic structure of aluminum film and UV-vis spectra, studies were of different plasma conditions on the film quality and its optical properties influence. The results show, adding RF ion source, microstructures of thin films have obvious changes. With the power increases, reflectivity peaks appear; microstructure characteristics have great influence on the optical properties, With the increase of surface roughness, transmittance of ultraviolet and visible light first decreases and then increases.