为满足关联成像系统抑制背景的需求，选用Al、Cr和SiO2作为镀膜材料，依据薄膜吸收理论，结合膜系设计软件设计了宽光谱吸收膜，并采用真空沉积技术获得了该薄膜样品.通过真空阶梯式退火，减小了膜层内应力，解决了薄膜牢固度问题；采用交互式分析对测试结果逆向反演，通过优化工艺参量，使膜系中敏感薄层厚度得以精准控制，并减小了膜厚控制误差.制备的吸收膜在400～1 100 nm波段平均吸收率达到99.1%，满足系统使用要求.

According to the demand for inhibiting background of the correlation system, Al, Cr and SiO2 were choosed as the coating materials. Based on the absorption theory, a broad spectrum absorbing film was designed by combining with the film design software, and by using the vacuum deposition technology, the film samples were prepared. The internal stress of the film was reduced by stepped vacuum annealing, and the problem of film adhesion was solved. Using the interactive analysis and reverse inversion methods to analyze the testing results, the thickness of sensitive thin layers was controlled precisely by optimizing the process parameters, as a result, and the thickness control error was reduced. The average absorptivity of prepared absorbing film is 99.1% at the band of 400～1 100 nm, which meets the requirements of the system.