全息波导元件的设计通常会分解为光栅设计和波导设计, 这种设计过程并不直观, 且不适用于加工误差分析。为了解决上述问题, 提出一种全息波导元件的综合分析方法, 以二维出瞳拓展的全息波导显示系统为例, 针对波导上下表面不平行度、光栅结构参数进行误差分析, 以便了解上述误差对成像质量的影响。通过对模型参数的误差分析, 对实际的生产加工过程提出有意义的精度指导。

The design process of holographic waveguide display system is usually divided into grating design and waveguide design,which is unintuitive and incapable for machining error analysis.Therefore,we propose a new comprehensive method for holographic waveguide design,which analyzes the diffraction process and transmission process of light synthetically.Taking the 2-D exit-pupil expander holographic waveguide display system as an example,analysis is made to the error caused by the waveguide wedge and grating parameters.In addition,their influence on imaging quality is also analyzed.This analysis method can provide the required accuracy for manufacture process.