采用发射光谱分析不同气体组分的等离子喷涂-物理气相沉积(PS-PVD)射流, 通过Abel转换得出射流径向各点处的光谱强度, 比较和分析射流中不同气体的成分分布。 采用多谱线斜率法研究不同气体组分的射流在径向距离上电子温度的变化, 通过Hβ谱线的stark展宽计算径向上电子密度的分布。 结果表明: Ar/H2气体中, H2在焰流中心区域(0～30 mm)分布较为均匀, 但在焰流中心稍靠外的区域(30～60 mm)随着径向距离的增加而增加; 加入He后, Ar和H2在焰流中心处浓度较低并在一定范围内随着径向距离的增加而增加, He往焰流中心聚集; 不同气体组分的电子温度和电子密度随着径向距离的增加而降低, 同时受到H2和He的影响。

Emission spectroscopy was used to analyze the plasma spray physical vapor deposition (PS-PVD) jet of different gas compositions and Abel inversion was used to calculate the spectral intensity of radial point to get the gas distributions of different gases. Multispectral line slope method was used to study the impact of radial distance and gas composition on electronic temperature. Radial distribution of electronic density was calculated by stark broadening. The results showed that: in Ar/H2 gas, H2 was well-distributed in the 0-30mm area and increased with radial distance in the 30~60 mm area; After adding He gas, the concentrations of Ar and H2 were low at the centre of jet and increased with radial distance, and He gathered at the centre of plasma jet; Electronic temperature and density decreased with the increase of radial distance, at the same time, influenced by H2 and He.