在DMD光刻设备中, 由于机械装调产生的机械误差导致曝光图像间产生拼接误差, 进而造成曝光图像出现错位、交叠等问题。为了消除 DMD在大面积曝光过程中的曝光误差, 对误差校正方法进行研究。首先, 利用显微镜对曝光后的基板进行测量得到曝光误差。然后, 在曝光误差的基础上建立误差模型。最后, 根据误差模型提出了基于运动补偿的 DMD光刻系统误差校正的方法, 该方法有别于目前已有的误差校正方法。实验结果表明, 在微米级图像曝光过程中, 曝光误差减少了 80%以上, DMD曝光中心偏移距离由 175 μm减少为 21 μm。有效提高曝光图像的拼接精度, 满足对大面积曝光图像的高质量、高精度等要求。

For the digital micromirror device (DMD) lithography equipment, due to the exposed images joint errors which caused by mechanical loading errors, problems such as misalignment and overlap of the exposed images may arise. In order to eliminate the exposure error of DMD during large-area exposure, the error correction method was studied. Firstly, the exposure error was got by measuring the exposed substrate with a microscope. Then, an error model was established based on the known exposure error. Finally, an error correction based on motion com-pensation for DMD lithography system was proposed based on the error model. This method is different from the existing error correction method. The experimental results show that during the micron image exposure process, the exposure error is reduced by more than 80%, and the DMD exposure center offset distance is reduced from 175 μm to 21 μm. The stitching accuracy of the exposed image is improved effectively, which meets the requirements for high quality and high precision of large-area exposure images.