针对光学相控阵存在难以校准的相位误差的问题，改进了旋转电矢量相控阵天线初始相位校准方法.与原始方法相比，该方法改变了相位计算方法，并且每测算出一个单元的相位误差立即进行相位矫正，然后测算并矫正下一个单元的相位误差，避免了原始方法在初始相位误差分布范围较广且光功率测量精度有限的情况下可能出现的π相位错误.仿真结果表明，原始方法校准后主瓣光强的平均值最多达到理想值的70.8%，标准差至少为19.1%；而改进方法校准后的主瓣强度均值至少可以达到理想值的87.6%，标准差最大7.3%，证明了改进方法具有更高的统计精度和可预测性.制备了9×9光学相控阵芯片，芯片初始的栅瓣抑制比为2.12 dB，改进的旋转电矢量法校准后则达到了4.68 dB，证明了该方法的有效性与实际应用价值.

To solve the problem that the phase error of the optical phased array is difficult to calibrate, rotating element electric field vector calibration method is modified. Comparing with the traditional method, the new method modifies the algorithm and corrects the phase immediately after measuring the phase error of one unit, then measures and corrects the phase of the next unit. Possible π phase error in traditional method is avoided when large initial phase distribution and finite optical power measurement accuracy present. The simulation results show that the main lobe intensity calibrated with the original method reaches at most 70.8% of the ideal value on average, and the standard deviation is at least 19.1%. While after calibration with the modified method the main lobe intensity reaches at least 87.6% of the ideal value on average, the maximum standard deviation is 7.3%. The modified method produces statistically more accurate and predictable calibration result. A 9×9 optical phased array chip is manufactured. The initial grating lobe suppression ratio ofthe chip is 2.12 dB. Calibrated with this modified method the ratio reaches 4.68 dB. The effectiveness and practical application value of this method are proved.