氧分压对ZrO<sub>2</sub>薄膜激光损伤阈值的影响

张东平; 赵元安; 范树海; 高卫东; 邵建达; 范正修

强激光与粒子束, 2005, 17 (1): 9, 网络出版: 2006-04-28

氧分压对ZrO₂薄膜激光损伤阈值的影响

Influences of oxygen partial pressure on the laser induced damage threshold of ZrO₂ film

论文大纲

张东平 ^1,2赵元安 ^1,2范树海 ^1,2高卫东 ^1,2邵建达 ¹范正修 ¹

作者单位

¹ 中国科学院,上海光学精密机械研究所薄膜中心,上海,201800

² 中国科学院,研究生院,北京,100039

ZrO₂薄膜氧分压激光损伤阈值电子束热蒸发 ZrO₂ films Oxygen partial pressure Laser induced damage threshold （LIDT） Electron beam evaporation

摘要

在不同的氧分压下用电子束热蒸发的方法制备了ZrO₂薄膜.分别通过X射线衍射、光学光谱、热透镜技术、抗激光辐照等测试,对所制备样品的微结构、折射率、吸收率及激光损伤阈值进行了测量.实验结果表明,薄膜中晶粒主要是四方相为主的多晶结构,并且随着氧分压的增加,结晶度、折射率以及弱吸收均逐渐降低.薄膜的激光损伤阈值开始随着氧分压增加从18.5 J/cm²逐渐增加,氧分压为9×10^-3Pa时达到最大,值为26.7 J/cm²,氧分压再增加时则又降低到17.5 J/cm².由此可见,氧分压引起的薄膜微结构变化是ZrO₂薄膜激光损伤阈值变化的主要原因.

Abstract

ZrO₂ films were prepared by electron beam evaporation method at different oxygen partial pressures. Through the measurement of XRD, surface thermal lensing technique, optical spectra and laser irradiate resistance testing, the microstructure, refractive index, absorption and laser induced damage threshold were measured. The experiment results indicate that the films are multi-crystal, and the tetragonal is dominant. With the oxygen partial pressure increasing, the crystalline, refractive index and weak absorption are all decreasing. The laser induced damage threshold (LIDT) increase with the oxygen partial pressure increase at first, and the LIDT reaches the maximum value 26.7 J/cm² nearby oxygen partial pressure of 9×10^-3 Pa, but the LIDT decreases when oxygen partial pressure continues increasing. So the oxygen partial pressure induced microstructure changing is the main factor that leads to the LIDT variation.

参考文献

[1] Wang Y J, Li Q G, Fan Z X. Anti-reflection films coated on sapphire for high power laser system[J]. High Power Laser and Particle Beams,2004,16(1) :55-58.

[2] 胡建平,马平,许乔,等.用1 064 nm激光增强HfO₂/SiO₂薄膜的抗激光损伤能力的实验研究[J].强激光与粒子束,2003,15(11):1053-1056.
Hu J P, Ma P, Xu Q, et al. Damage threshold improvement of HfO₂/SiO₂ coating by 1 064 nm laser conditioning. High Power Laser and Particle Beams, 2003,15(11): 1053-1056.

[3] Shao S Y,Fan Z X, Shao J D ,et al. Evolutions of residual stress and microstructure in ZrO₂ thin films deposited at different temperatures and rates[J]. Thin Solid Films, 2003, 445(2) :59-62.

[4] Koski K, Holsa J, Juliet P. Properties of zirconium oxide thin films deposited by pulsed reactive magnetron sputtering[J]. Surface and Coating Technology, 1999, 120-121(2-3) :303-312.

[5] Hacker E, Lauth H, Weibrodt P. Review of structural influence on the laser damage thresholds of oxide coatings[A]. Proc of SPIE[C].1996,2714: 316-330.

[6] Zhao Y A, Wang Y J, Gong H, et al. Annealing effects on structure and laser induced damage threshold of Ta₂O₅/SiO₂ dielectric mirrors[J]. Applied Surface Science, 2003,210(3-4) :353-358.

[7] Exarhos G J, Hess N J, Wood S M. Surface morphology, phase characterization and stability of solution-deposited zirconia films[A]. Proc of SPIE[C]. 1992, 1848: 299-311.

[8] Gao P T, Meng L J, Santos M P. Influence of sputtering pressure on the structure and properties of ZrO₂ films prepared by RF reactive sputtering[J]. Applied Surface Science ,2001,173(1-2) :84-90.

[9] Walker T W,Guenther A H, Nielsen P E. Pulsed laser induced damage to thin film optical coatings: Part Ⅱ Theory [J]. IEEE J of Quant Electro, 1981,17(10): 2053-2065.

[10] Shaw L J,Burns S J, Jacobs S D. Model for laser damage dependence on thin film morphology[J]. Appl Opt, 1993,32(21) :3925-3929.

[11] Scaglione S, Sarto F, Alvisi M, et al. Correlation between the structural and optical properties of ion assisted hafnia thin films[A]. Proc of SPIE[C]. 2000, 3092 : 194-203.

[12] Macleod H A. Thin films for optical systems[M]. New York: Marcel Dekker,1995.1-39.

[13] Pulker H K. Stress, adherence, hardness and density of optical films [A]. Proc Soc Photo-Opt instrumentation Eng[C] . 1982,325:84-92.

张东平, 赵元安, 范树海, 高卫东, 邵建达, 范正修. 氧分压对ZrO₂薄膜激光损伤阈值的影响[J]. 强激光与粒子束, 2005, 17(1): 9. ZHANG Dong-ping, ZHAO Yuan-an, FAN Shu-hai, GAO Wei-dong, SHAO Jian-da, FAN Zheng-xiu. Influences of oxygen partial pressure on the laser induced damage threshold of ZrO₂ film[J]. High Power Laser and Particle Beams, 2005, 17(1): 9.

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