强激光与粒子束, 2010, 22 (7): 1436, 网络出版: 2010-09-15   

预处理对355 nm激光作用下熔石英损伤增长的影响

Effects of pre-conditioning on 355 nm laser-induced damage growth of fused silica
作者单位
1 电子科技大学 物理电子学院, 成都 610054
2 中国工程物理研究院 激光聚变研究中心, 四川 绵阳 621900
摘要
测试了经化学蚀刻、紫外激光预处理及其共同处理后的熔石英355 nm激光损伤阈值;研究了处理前后其损伤斑面积随激光辐照脉冲数的增长情况。结果表明, 处理后熔石英355 nm激光损伤阈值得到了提高, 且损伤斑面积增长变慢。利用CO2激光对熔石英表面损伤点进行了修复处理, 修复后的损伤点R-on-1抗损伤阈值和基底阈值相当, 损伤增长得到有效抑制。
Abstract
Laser-induced damage threshold of fused silica under 355 nm laser were measured before and after chemical etching, UV laser conditioning, and the combined processing. The area of damage spots increased with successive pulses irradiation. The results showed that the laser-induced damage threshold of processed samples increased while the area growth rate decreased. Mitigation of damage sites on fused silica by localized CO2 laser treatment was also investigated. The laser-induced damage threshold of treated damage sites was as high as the fused silica substrate by R-on-1 tests. The damage growth of treated sites on fused silica was mitigated effectively.
参考文献

[1] Kozlowski M R, Mouser R, Maricle S, et al. Laser damage performance of fused silica components measurement on beamlet laser at 351 nm[C]//Proc of SPIE. 1999, 3578: 436-445.

[2] Razé G, Morchain J M, Loiseau M, et al. Parametric study of the growth of damage sites on the rear surface of fused silica windows[C]//Proc of SPIE. 2003, 4932: 127-135.

[3] Josse M, Courchinoux R, Lamaignere L, et al. Computer-controlled measurements of laser-induced damage statistics on large optics[C]//Proc of SPIE. 2005, 5647: 365-372.

[4] Norton M A, Hrubesh L W, Wu Z, et al. Growth of laser-initiated damage in fused silica at 351 nm[R]. UCRL-JC-139624, 2001.

[5] Norton M A, Donohue E E, Hollingsworth W G, et al. Growth of laser-initiated damage in fused silica at 527 nm[C]//Proc of SPIE. 2004, 5273: 236-243.

[6] Yoshiyama J, Ganin F Y, Salleo A, et al. A study of the effects of polishing,etching,cleaving,and water leaching on the UV laser damage of fused silica[C]//Proc of SPIE. 1998, 3244: 331-340.

[7] Brusasco R M, Penetrante B M, Butler J A, et al. UV laser conditioning for the reduction of 351-nm damage initiation in fused silica[C]//Proc of SPIE. 2002, 4679: 48-55.

[8] Brusasco R M, Penetrante B M, Butler J A, et al. Localized CO2 laser treatment for mitigation of 351 nm damage growth on fused silica[C]//Proc of SPIE. 2002, 4679: 40-47.

[9] Wang J, Ferriera J L, Lindsey E F, et al. Morphology and microstructure in fused silica induced by high fluence ultraviolet 3ω (355 nm) laser pulses[J]. J Non-Cryst Solids, 2006, 352(3): 255-272.

[10] 尹伟,徐世珍,祖小涛,等. 355 nm激光作用下熔石英损伤增长[J]. 强激光与粒子束, 2008, 20(12):1989-1992. (Yin Wei, Xu Shizhen, Zu Xiaotao, et al. Growth of laser initiated damage in fused silica at 355 nm. High Power Laser and Particle Beams, 2008, 20(12):1989-1992).

[11] 徐世珍,吕海兵,田东斌,等. 酸蚀深度对熔石英三倍频激光损伤阈值的影响[J]. 强激光与粒子束,2008,20(5):760-764.(Xu Shizhen, Lü Haibin, Tian Dongbin, et al. Effects of acid-etching depth on 355 nm laser-induced damage threshold of fused silica. High Power Laser and Particle Beams, 2008, 20(5):760-764).

[12] Hrubesh L W, Norton M A, Molander W A, et al. Chemical etch effects on laser-induced surface damage growth in fused silica[C]//Proc of SPIE. 2001, 4347: 553-559.

[13] Salleo A, Chinsio R, Genin F Y. Crack propagation in fused silica during UV and IR nanosecond-laser illumination[C]//Proc of SPIE. 1999, 3578: 456-471.

[14] Dahmani F, Lambropoulos J C, Burns S J, et al. How small stresses affect 351-nm damage onset in fused silica[C]//Proc of SPIE. 1999, 3578: 431-435.

徐世珍, 蒋晓东, 郑万国, 袁晓东, 祖小涛. 预处理对355 nm激光作用下熔石英损伤增长的影响[J]. 强激光与粒子束, 2010, 22(7): 1436. Xu Shizhen, Jiang Xiaodong, Zheng Wanguo, Yuan Xiaodong, Zu Xiaotao. Effects of pre-conditioning on 355 nm laser-induced damage growth of fused silica[J]. High Power Laser and Particle Beams, 2010, 22(7): 1436.

本文已被 1 篇论文引用
被引统计数据来源于中国光学期刊网
引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!