光学学报, 1995, 15 (3): 313, 网络出版: 2007-08-17
激光等离子体软X射线接近式光刻术初步研究
Preliminary Study of Laser Soft X-Ray Approach Lithography
摘要
描述了用高功率脉冲激光打靶产生的等离子体作为软Ｘ射线源而进行的接近式软Ｘ射线光刻研究。采用负性辐射线光刻胶聚氯甲基苯乙烯(PCMS)，得到了一些新的实验结果。
Abstract
Using high- power pulsed laser- produced plasma as soft X- ray source for approach lithography is described in this paper. By applying negative resist PCMS, some new experimental results are obtained.
郭玉彬, 李福田, 唐九华, 李加. 激光等离子体软X射线接近式光刻术初步研究[J]. 光学学报, 1995, 15(3): 313. 郭玉彬, 李福田, 唐九华, 李加. Preliminary Study of Laser Soft X-Ray Approach Lithography[J]. Acta Optica Sinica, 1995, 15(3): 313.
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