全染料系光刻胶在液晶显示器中的应用
[1] 赵成阳, 魏杰.光刻胶发展概述[J].信息记录材料, 2015, 16(5): 42-49.
ZHAO C Y, WEI J. The overview of photoresist’s development[J]. Information Recording Materials,2015, 16(5): 42-49. (in Chinese)
[2] PFEIFFER F, FELIX N M, NEUBER C, et al. Physical vapor deposition of molecular glass photoresists: a new route to chemically amplified patterning[J]. Advanced Functional Materials,2007, 17(14): 2336-2342.
[3] WAGNER C, HARNED N. EUV lithography: lithography gets extreme[J]. Nature Photonics,2010, 4(1): 24-26.
[4] DAI J, CHANG S W, HAMAD A, et al. Molecular glass resists for high-resolution patterning[J]. Chemistry of Materials, 2006, 18(15): 3404-3411.
[5] FUKUSHIMA Y, WATANAB T, OHNISHI R, et al. PAG study of PAG bonded resist for EUV and EB lithography[J]. Journal of Photopolymer Science and Technology,2008, (): 465-468.
[6] 庞玉莲, 邹应全.光刻材料的发展及应用[J].信息记录材料, 2015, 16(1): 36-51.
PANG Y L, ZOU Y Q. Development and application of lithography materials[J]. Information Recording Materials,2015, 16(1): 36-51. (in Chinese)
[7] DE SILVA A, OBER C K. Hydroxyphenylbenzene derivatives as glass forming molecules for high resolution photoresists[J]. Journal of Materials Chemistry,2008, 18(16): 1903-1910.
[8] 许箭, 陈力, 田凯军, 等.先进光刻胶材料的研究进展[J].影像科学与光化学, 2011, 29(6): 417-429.
XU J, CHEN L, TIAN K J, et al. Molecular structure of advanced photoresists[J]. Imaging Science and Photochemistry,2011, 29(6): 417-429. (in Chinese)
曾娅, 魏雄周, 万彬, 黎敏, 闵泰烨. 全染料系光刻胶在液晶显示器中的应用[J]. 液晶与显示, 2020, 35(9): 933. ZENG Ya, WEI Xiong-zhou, WAN Bin, LI Min, MIN Tai-ye. Application of All Dye Blue photoresist in liquid crystal display[J]. Chinese Journal of Liquid Crystals and Displays, 2020, 35(9): 933.