TFT光刻平面补偿优化
张玉虎, 徐海涛, 李亚文, 罗传文, 曹少波, 李力. TFT光刻平面补偿优化[J]. 光电工程, 2019, 46(5): 180444.
Zhang Yuhu, Xu Haitao, Li Yawen, Luo Chuanwen, Cao Shaobo, Li Li. The improvement of TFT lithography plane compensation[J]. Opto-Electronic Engineering, 2019, 46(5): 180444.
[1] 王新久 . 液晶光学和液晶显示 [M].北京: 科学出版社 , 2006: 230–251.
Wang X J. Liquid Crystal Optics & Liquid Cristal Display[M]. Beijing: Science Press, 2006: 230–251.
[2] 邵喜斌. 液晶显示技术的最新进展[J].液晶与显示, 2000, 15(3): 163–170.
Shao X B. Recent progress of liquid crystal display technolo-gy[J]. Chinese Journal of Liquid Crystals and Displays, 2000, 15(3): 163–170.
[3] 车春城. 广视角 FFS技术 CELL研究与设计[D].成都: 电子科技大学, 2007: 1–6.
Che C C. CELL research and design of FFS wide viewing angle technology[D]. Chengdu: University of Electronic Science and Technology of China, 2007: 1–6.
[4] 童林夙. 2012年后的平板显示世界[J].现代显示, 2007(7): 6–16.
Tong L S. Flat panel displays after 2012[J]. Advanced Display, 2007(7): 6–16.
[5] 黎午升, 惠官宝, 崔承镇, 等. 在镜像投影曝光机上使用相移掩膜提高解像力的初步研究 [J]. 液晶与显示 , 2014, 29(4): 544–547.
LiWS, Hui G B, Cui C Z, et al. Preliminary study on improving resolution on mirror projection mask aligner with phase shift mask[J]. Chinese Journal of Liquid Crystals and Displays, 2014, 29(4): 544–547.
[6] 肖文俊 . 薄膜晶体管液晶显示器的串扰研究 [D]. 北京: 北京交通大学, 2014: 1–4.
Xiao W J. A Research on crosstalk in TFT-LCDs[D]. Beijing: Beijing Jiaotong University, 2014: 1–4.
[7] Chun J Y, KangC H, Ahn S J, et al. A-Si TFT-LCD mobile display with high pixel density using PenTile RGB WTM algo-rithm[J]. Chinese Journal of Liquid Crystals and Displays, 2006, 21(5): 474–477.
[8] 冯伯儒, 张锦, 侯德胜, 等. 相移掩模和光学邻近效应校正光刻技术[J].光电工程, 2001, 28(1): 1–5.
Feng B R, Zhang J, Hou D S, et al. Optical microlithography with phase-shifting mask and optical proximity effect correc-tion[J]. Opto-Electronic Engineering, 2001, 28(1): 1–5.
[9] 缪小运 . 先进光刻系统中焦平面测量与控制的研究 [D]. 上海: 复旦大学, 2006: 5–9.
Miu X Y. Focal Plane Measure and Control Study[D]. Shanghai: Fudan University, 2006: 5–9.
[10] 黎午升, 惠官宝, 崔承镇, 等. 相移掩膜应用于显示技术光刻细线化的初步研究[J].光电子技术, 2014, 34(4): 234–237.
LiWS, Hui G B, Cui C Z, et al. Preliminary study on improving photolithographic resolution of display technology with phase shift mask[J]. Optoelectronic Technology, 2014, 34(4): 234–237.
张玉虎, 徐海涛, 李亚文, 罗传文, 曹少波, 李力. TFT光刻平面补偿优化[J]. 光电工程, 2019, 46(5): 180444. Zhang Yuhu, Xu Haitao, Li Yawen, Luo Chuanwen, Cao Shaobo, Li Li. The improvement of TFT lithography plane compensation[J]. Opto-Electronic Engineering, 2019, 46(5): 180444.
PDF全文
