在电子束蒸发沉积制备ZrO2薄膜的过程中,采用石英晶体振荡法监控膜厚和沉积速率。用NKD7000分光光度计测量了ZrO2薄膜的折射率和膜厚,用原子力显微镜分别观测了不同工作气压和沉积速率下薄膜的表面形貌、均方根粗糙度。结果表明,随着工作气压的升高,膜层的结构变疏松,薄膜的折射率和均方根粗糙度都随之减小。随着沉积速率的增大,膜层的结构变致密,薄膜的折射率和均方根粗糙度都随之增大。并且从工具因子（TF）的角度得到了证实。实际镀膜过程中应该根据激光薄膜的应用需要选用合适的工艺条件,在允许的均方根粗糙度范围内提高膜层的结构致密性和折射率。

ZrO2 coatings were prepared by electron beam evaporation,while coating thickness and deposition rate were monitored and demonstrated by quartz crystal oscillation. The refractive index and thickness of ZrO2 coatings were measured by NKD7000 spectrophotometer. The surface morphology and root-mean-square (RMS) roughness had been characterized by atomic force microscopy (AFM). It was found that the refractive index and RMS roughness were decreasing as the working pressure was increasing; the refractive index and RMS roughness were also increasing as a result of increasing deposition rate. Which were agreed with the results of tooling factor. Proper process conditions had to be used in order to get optical coatings with better structures under proper RMS roughness.